Measurements of current density distribution in shaped e-beam writers

Bok, Jan; Horáček, Miroslav; Kolařík, Vladimír; Urbánek, Michal; Matjěka, Milan; Krzyránek, Vladislav

doi:10.1016/j.mee.2015.09.013

Cited by 2 publications

(1 citation statement)

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“…Telas de fósforo são importantes ferramentas empregadas em diversas tecnologias que utilizam íons, elétrons, fótons, radiação ultravioleta (UV) e raios-x, tais como detectores com placas de microcanais (MCPs do inglês micro channel plates), 1 detectores de raios-x, 2 detectores de elétrons e UV, 3 além dos microscópios baseados em emissão de elétrons e sistemas de análises de feixe de elétrons. 4 Neste artigo será abordada a fabricação e aplicação de telas de fósforo em microscopia por emissão de campo (FEM), que é uma técnica bem estabelecida e tem sido usada desde a década de 50, apresentando imagens, normalmente, com resolução da ordem de angstrons. [5][6] A montagem do sistema é simples, sendo necessário somente o emissor de elétrons, que será estudado, uma grade para propiciar a emissão e uma janela recoberta com fósforo, que é um material que, quando exposto à radiação (feixe de elétrons), emite luz visível.…”

Section: Introductionunclassified

Telas de fósforo para projeção de imagem

Hamanaka¹,

Silva²,

Hamanaka³

et al. 2017

Quim. Nova

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PHOSPHOR SCREENS FOR IMAGE PROJECTION. In this work we describe a methodology to obtain phosphor screens used in various applications to produce images or patterns such as detectors and microscopes. The main advantages of these screens are the particle free and self-heating properties that allows it to be used in controlled environments minimizing the adsorbed gases in the surface of the screen. A polyvinyl alcohol deposited on top of the phosphor layer acts as an adhesive layer preventing the removal of phosphor particles from the screen surface that could result in measurement environment contamination. The tin oxide layer has a high melting point enabling the self-heating. These characteristics on screens are important for ultra-high vacuum environment and to study carbon nanotube emission patterns through field emission microscopy (FEM).

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Section: Introductionunclassified

Telas de fósforo para projeção de imagem

Hamanaka¹,

Silva²,

Hamanaka³

et al. 2017

Quim. Nova

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Analysis on Defocusing and Astigmatism of Electron Beam Selective Melting Machines

Sun

Yin

Wang

et al. 2020

J. Phys.: Conf. Ser.

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Affected by defocusing and astigmatism, the quality of electron beam steadily deteriorated with increasing deflection distance, limiting the processing area of SEBM machines. The relationship among beam spot size, deflection distance and deflection direction are studied by numerical simulation, which explains the cause of decreasing power density. The experimental results show that defocus is the main factor affecting the beam spot size when the deflection distance is less than 100 mm and astigmatism is the main factor at a larger deflection distance. Then, the chessboard electron imaging experiment is carried out to verify that the spot size increases with the deflection distance. Thus, dynamic focusing and astigmatism should be introduced at the same time to minimize beam area.

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Measurements of current density distribution in shaped e-beam writers

Cited by 2 publications

References 20 publications

Telas de fósforo para projeção de imagem

Telas de fósforo para projeção de imagem

Analysis on Defocusing and Astigmatism of Electron Beam Selective Melting Machines

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