Measurement system for wide-range flow evaluation and thermal characterization of MEMS-based thermoresistive flow-rate sensors

Djuzhev, N. A.; Ryabov, Vladimir T.; Demin, G. D.; Makhiboroda, M. A.; Evsikov, Ilya D.; Pozdnyakov, Mikhail M.; Беспалов, В. А.

doi:10.1016/j.sna.2021.112832

Cited by 15 publications

(9 citation statements)

References 18 publications

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“…At the heart of sensor products is the CMOS technology using the latest TSRI/UMC 0.18 µm single-poly-six-metal (1P6M) process, which enables us to combine the sensor component with amplifier circuitry on a tiny CMOS silicon chip. The CMOS MEMS technology provides error-free gas flow metering that remains stable over a long period and generates a fast and high-precision sensor signal, recently [93][94][95][96][97]. Figure 2a shows the UMC 0.18 µm CMOS process proceeded with isotropic XeF 2 undercut etching for the MEMS open area; Figure 2b shows the use of shallow-trench-isolation (STI) to protect polysilicon during the etching process.…”

Section: Educational Cmos Foundry Service Provided By Tsrimentioning

confidence: 99%

Foundry Service of CMOS MEMS Processes and the Case Study of the Flow Sensor

et al. 2022

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The complementary metal-oxide-semiconductor (CMOS) process is the main stream to fabricate integrated circuits (ICs) in the semiconductor industry. Microelectromechanical systems (MEMS), when combined with CMOS electronics to form the CMOS MEMS process, have the merits of small features, low power consumption, on-chip circuitry, and high sensitivity to develop microsensors and micro actuators. Firstly, the authors review the educational CMOS MEMS foundry service provided by the Taiwan Semiconductor Research Institute (TSRI) allied with the United Microelectronics Corporation (UMC) and the Taiwan Semiconductor Manufacturing Company (TSMC). Taiwan’s foundry service of ICs is leading in the world. Secondly, the authors show the new flow sensor integrated with an instrumentation amplifier (IA) fabricated by the latest UMC 0.18 µm CMOS MEMS process as the case study. The new flow sensor adopted the self-heating resistive-thermal-detector (RTD) to sense the flow speed. This self-heating RTD half-bridge alone gives a normalized output sensitivity of 138 µV/V/(m/s)/mW only. After being integrated with an on-chip amplifier gain of 20 dB, the overall sensitivity of the flow sensor was measured and substantially improved to 1388 µV/V/(m/s)/mW for the flow speed range of 0–5 m/s. Finally, the advantages of the CMOS MEMS flow sensors are justified and discussed by the testing results.

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Section: Educational Cmos Foundry Service Provided By Tsrimentioning

confidence: 99%

Foundry Service of CMOS MEMS Processes and the Case Study of the Flow Sensor

et al. 2022

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“…The current trend to thin-film microheaters (microhotplates) has numerous advantages, such as compact device size, low power consumption, fast response time, and improved reproducibility, owing to the application of well-automated microelectronic fabrication techniques. Thin-film microheaters are used as an integral part of semiconductor [ 1 , 2 ] and thermocatalytic [ 3 , 4 , 5 ] gas sensors, gas flow rate sensors [ 6 , 7 ], and fuel cells [ 8 ]; they can be applied to high-temperature in situ microscopy [ 9 , 10 , 11 ], microfluidic chips [ 12 ], quartz crystal microbalances [ 13 ], micrometer-scale phase modulators [ 14 ] and thermoelectrics [ 15 , 16 ].…”

Section: Introductionmentioning

confidence: 99%

Long-Term Operational Stability of Ta/Pt Thin-Film Microheaters: Impact of the Ta Adhesion Layer

et al. 2022

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Microheaters with long-term stability are crucial for the development of a variety of microelectronic devices operated at high temperatures. Structured Ta/Pt bilayers, in which the Ta sublayer ensures high adhesion of the Pt resistive layer, are widely used to create microheaters. Herein, a comprehensive study of the microstructure of Ta/Pt films using high-resolution transmission electron microscopy with local elemental analysis reveals the twofold nature of Ta after annealing. The main fraction of Ta persists in the form of tantalum oxide between the Pt resistive layer and the alumina substrate. Such a sublayer hampers Pt recrystallization and grain growth in bilayered Ta/Pt films in comparison with pure Pt films. Tantalum is also observed inside the Pt grains as individual Ta nanoparticles, but their volume fraction is only about 2%. Microheaters based on the 10 nm Ta/90 nm Pt bilayers after pre-annealing exhibit long-term stability with low resistance drift at 500 °C (less than 3%/month).

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“…Based on a thermal tracer, a flow velocity measurement method has been reported in, 13 temperature information is used to solve the problems in flow velocity monitoring due to the presence of sand in oil-water two phase flow. A proposed measurement system for a wide-range flow sensor was developed by 14 to determine the thermal characteristics of the flow. The results can be used in developing and designing measurement systems for micro-electromechanical-systembased thermal gas flow sensors.…”

Section: Introductionmentioning

confidence: 99%

An adaptive calibration technique for thermistor with varying temperature coefficient and reference resistance

2022

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Background: A thermistor is a nonlinear sensor requiring a precise calibration technique to achieve accurate temperature measurements. This paper attempts to design a calibration technique employing artificial neural network (ANN) algorithms. The present work fulfills the following objectives: (i) to cover 100% input range in the linearity range measurement; (ii) to make the measurement technique adaptive to variations in reference resistance and thermistor temperature coefficient using a calibration technique. Methods: An ANN-based calibration circuit is cascaded to the data conversion circuit. Optimized ANN is trained with linear data independent of reference resistance and temperature coefficient effects on thermistor output. ANN optimization is performed by comparing various schemes, algorithms, and numbers of hidden layers to achieve a minimum mean square error and a regression close to 1. Results: The proposed technique provides a linear relationship for the system over the entire input range and avoids the requirement of repeated calibrations each time the thermistor is replaced. Practical data are used to validate the proposed measurement technique. Conclusions: The objectives and proposed technique have been demonstrated by results with a root mean square percentage error of 1.8%.

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Measurement system for wide-range flow evaluation and thermal characterization of MEMS-based thermoresistive flow-rate sensors

Cited by 15 publications

References 18 publications

Foundry Service of CMOS MEMS Processes and the Case Study of the Flow Sensor

Foundry Service of CMOS MEMS Processes and the Case Study of the Flow Sensor

Long-Term Operational Stability of Ta/Pt Thin-Film Microheaters: Impact of the Ta Adhesion Layer

An adaptive calibration technique for thermistor with varying temperature coefficient and reference resistance

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