“…The existence of this reflection is mainly due to asymmetry in the bonding charge and, to a lesser degree, to anharmonic thermal vibrations. The data reported for the Si 222 reflection were obtained predominantly by measuring the integrated intensity of diffracted X-rays (G/Sttlicher & W61fel, 1959;Renninger, 1960;DeMarco & Weiss, 1965a;Colella & Merlini, 1966;Hewat, Prager, Stephenson & Wagenfeld, 1969;Jennings, 1969;Roberto & Batterman, 1970;Rozenberg & Kleschinski, 1976) and y-rays (Alkire, Yelon & Schneider, 1982). The Pendell6sung technique has also been used (Fujimoto, 1974;Fehlmann & Fujimoto, 1975).…”