Elastic light scattering has been used to measure the time evolution of the power spectrum of the surface morphology of strained InGaAs layers during growth. From a combination of fixed scattering angle measurements during growth and variable scattering angle measurements after growth, we are able to determine both the time and spatial frequency dependence of the power spectral density during relaxation of the strained films via misfit dislocations. The data are fit with an EdwardsWilkinson model, for which the surface morphology is driven by inhomogeneous surface strains.[S0031-9007(97)03924-0] PACS numbers: 68.55.Jk, 61.16.Ch, 78.35. + c, 81.15.Hi Computer simulations and analytical theory have contributed greatly to our understanding of the dynamical behavior of surface morphology during thin film growth. Experimental studies have been less definitive however. For example, the general form of the equations that describe surface morphology in the continuum limit is known from theory [1], yet experimental tests of these theories have tended to be limited to studies of the scaling relations for the interface width. The systems for which thin film growth is best understood are single crystal semiconductor films of Si, SiGe, and III-V semiconductors [2][3][4][5]. In this paper we use laser light scattering (LLS) to explore the dynamics of surface morphology in one of these systems, namely, strained InGaAs on GaAs, and compare the results with the predictions of the continuum growth models.Electron diffraction techniques, which are the most commonly used surface structure probes, are not sensitive to the large scale structures of interest in studies of morphology in the continuum limit, due to the short coherence length of the electrons. Laser light scattering does not have this problem. For the mirrorlike substrates used in crystal growth experiments, LLS can detect atomic-scale changes in the surface height on lateral length scales comparable to an optical wavelength [6]. In addition to being highly sensitive, LLS is well suited to in situ measurements during growth [6,7]. A potential problem is that light scattering is sensitive to particles and point defects on the surface, which are difficult to distinguish from the scattering due to the surface morphology. However, by comparing light scattering results with atomic force microscope (AFM) measurements, we have found that LLS provides reliable quantitative morphology information [8]. In addition, the scattering considered in this paper is highly anisotropic, indicating that it is dominated by the crosshatched morphology of the surface and not by the isotropic scattering expected from particles.Light scattering measurements were carried out in a VG V80H molecular beam epitaxy (MBE) chamber [6], with a 27 mW, 488 nm Ar 1 laser incident normal to the substrate. The diffusely scattered light was detected simultaneously at 25 ± and 55 ± from the surface normal. The sample orientation was fixed during growth such that the plane of scattering defined by the detector ...