1991
DOI: 10.1049/el:19910855
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Measurement of negative differential conductance to 40 GHz for vertically integrated resonant tunnelling diodes

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Cited by 9 publications
(3 citation statements)
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“…Following our previous works, we are able to measure the small-signal impedance versus frequency characteristics of RTD in the NDR range [11] and in the thermally activated tunneling process [12] over a large frequency range. For the present measurements, the individual chips were mounted in BMH 60 microwave packages.…”
Section: Methodsmentioning
confidence: 99%
“…Following our previous works, we are able to measure the small-signal impedance versus frequency characteristics of RTD in the NDR range [11] and in the thermally activated tunneling process [12] over a large frequency range. For the present measurements, the individual chips were mounted in BMH 60 microwave packages.…”
Section: Methodsmentioning
confidence: 99%
“…Following our previous work [12], on-wafer reflection gain measurements were performed between 50 MHz and 40 GHz using cascade RF probes and an 85107 A HP network analyser. Shown in Figure 6 is the one port measurement of a vertically integrated sample.…”
Section: And Ac Characterizationmentioning
confidence: 99%
“…A low parasitic environment also avoids spurious self oscillations which distort the I-V characteristics and prohibit impedance measurements in the NDR region. From this point of view, characterising a NDR effect which extends from dc to a high cut-off frequency is a formidable task [ 15]. The implementation of RTD operating at high frequency requires a high current density and this feature is undesirable for circuit stabilisation because the impedance level of devices has to be increased to obtain stability (Ls < RsRdCd) [ 16] .…”
mentioning
confidence: 99%