2014
DOI: 10.1007/s11664-014-3160-z
|View full text |Cite
|
Sign up to set email alerts
|

MBE Growth of Strained HgTe/CdTe Topological Insulator Structures

Abstract: International audienc

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1

Citation Types

0
13
0

Year Published

2015
2015
2019
2019

Publication Types

Select...
6
1

Relationship

2
5

Authors

Journals

citations
Cited by 20 publications
(13 citation statements)
references
References 17 publications
0
13
0
Order By: Relevance
“…INTRODUCTION The physics of relativistic Dirac fermions in semiconductors has recently moved into the focus of modern research, due to their unique properties and promising novel applications, for recent reviews see [1][2][3][4][5][6] . Among diverse systems addressed in the literature HgTe-based structures represent an extraordinary material class, allowing the fabrication of a high quality material [7][8][9][10][11][12] with Dirac-like systems of different forms. The latter includes topological protected edge and surface states of twoand three-dimensional topological insulators [13][14][15][16][17][18][19][20][21][22][23][24][25][26] , QWs with critical thickness 13,[27][28][29][30][31][32][33][34] and bulk HgCdTe material at the point of semiconductor-to-semimetal transition 35 .…”
Section: Pacs Numbersmentioning
confidence: 99%
“…INTRODUCTION The physics of relativistic Dirac fermions in semiconductors has recently moved into the focus of modern research, due to their unique properties and promising novel applications, for recent reviews see [1][2][3][4][5][6] . Among diverse systems addressed in the literature HgTe-based structures represent an extraordinary material class, allowing the fabrication of a high quality material [7][8][9][10][11][12] with Dirac-like systems of different forms. The latter includes topological protected edge and surface states of twoand three-dimensional topological insulators [13][14][15][16][17][18][19][20][21][22][23][24][25][26] , QWs with critical thickness 13,[27][28][29][30][31][32][33][34] and bulk HgCdTe material at the point of semiconductor-to-semimetal transition 35 .…”
Section: Pacs Numbersmentioning
confidence: 99%
“…Particular attention to lower the defects present in the HgTe layer and to obtain sharp HgTe / Hg 0.3 Cd 0.7 Te interfaces was paid during the structure growth [15] (see Fig.1 (b)). Two different structures with similar thickness were grown and gave very similar results.…”
mentioning
confidence: 99%
“…Molecular beam epitaxy of HgTe/CdTe layers is achieved in a Riber 32 chamber [9]. HgTe layers are grown on either (1 0 0) CdTe or (2 1 1)B CdTe substrates.…”
Section: Mbe Growth Of Hgte/cdte Structuresmentioning
confidence: 99%
“…The aim is to compensate the substrate remaining surface defects and so to perform the growth on a more flat surface. The substrate is then cooled down to the growth temperature for strained HgTe layer [9].…”
Section: Mbe Growth Of Hgte/cdte Structuresmentioning
confidence: 99%
See 1 more Smart Citation