2005
DOI: 10.1016/j.jcrysgro.2004.11.308
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MBE growth of MnGeP2 thin films

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Cited by 3 publications
(2 citation statements)
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References 7 publications
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“…MnCePz and MnP were grown using MBE technique on GaAs (001) substrates, details of the technique having been described elsewhere [2]. The Ge-buffer layer was deposited on GaAs (001) substrate at 380"C, followed by groyth of MnCePz and MnP at 435°C.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…MnCePz and MnP were grown using MBE technique on GaAs (001) substrates, details of the technique having been described elsewhere [2]. The Ge-buffer layer was deposited on GaAs (001) substrate at 380"C, followed by groyth of MnCePz and MnP at 435°C.…”
Section: Methodsmentioning
confidence: 99%
“…We have been investigating chalcopyrite-based room temperature ferromagnetic semiconductors Zn].,Mn,GeP2 and Cdl-,Mn,GePz [I]. In the previous study, we succeeded in preparation of MnGePa (x=l in 111.,Mn,GeP2 series) films on GaAs and InP substrates using molecular beam epitaxy (MBE) [2]. Magnetic studies revealcd that the MnGePz film also shows room temperature ferromagnetism with Tc=320K [3].…”
Section: Introductionmentioning
confidence: 99%