2012
DOI: 10.1007/s11664-012-2113-7
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MBE Growth of MCT on GaAs Substrates at AIM

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Cited by 18 publications
(13 citation statements)
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“…Despite these local areas of focus, there was also a great range of research on individualized topics [56,57]. Further research was performed on multicolor detectors, focusing on moving into the MWIR and LWIR regimes utilizing multiple absorbing layers [58].…”
Section: Bulk Detectorsmentioning
confidence: 99%
“…Despite these local areas of focus, there was also a great range of research on individualized topics [56,57]. Further research was performed on multicolor detectors, focusing on moving into the MWIR and LWIR regimes utilizing multiple absorbing layers [58].…”
Section: Bulk Detectorsmentioning
confidence: 99%
“…The other track relies on molecular beam epitaxy (MBE) using 4-inch GaAs substrates [2,3]. The HOT-detectors considered here are LPE-based.…”
Section: Technological Aspectsmentioning
confidence: 99%
“…For the growth process, GaAs substrates with (211)B orientation and a diameter of 100 mm are used. The continuous advance in process development since early 2010 has been documented in several previous publications [2][3][4][5][6].…”
Section: Mbe Growth Processmentioning
confidence: 99%
“…Over the course of the last years, rapid progress in the performance of MBE-grown material has been achieved at AIM [2][3][4][5][6]. In parallel, efforts continue to improve traditional LPE-grown material on CdZnTe substrates, especially with respect to HOT applications.…”
Section: Mwir Mctmentioning
confidence: 99%