2017
DOI: 10.1109/tpel.2016.2610460
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Maximizing the Performance of 650-V p-GaN Gate HEMTs: Dynamic RON Characterization and Circuit Design Considerations

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Cited by 215 publications
(94 citation statements)
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“…The combination of GaN channel thickness and buffer layer material properties and dimensions have to be optimized accordingly. normally rely on compensated (in many cases C-doped) buffer structures often in combination with ternary AlGaN layers [34][35][36]. The dynamic RON data for 400-600 V switching of p-GaN gate HFETs (Figure 6) are competitive to values achieved with normally-on HFETs using MIS or Schottky-type gate modules [22,24].…”
Section: Normally-off Transistors With P-gan Gate: Technology and Permentioning
confidence: 99%
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“…The combination of GaN channel thickness and buffer layer material properties and dimensions have to be optimized accordingly. normally rely on compensated (in many cases C-doped) buffer structures often in combination with ternary AlGaN layers [34][35][36]. The dynamic RON data for 400-600 V switching of p-GaN gate HFETs (Figure 6) are competitive to values achieved with normally-on HFETs using MIS or Schottky-type gate modules [22,24].…”
Section: Normally-off Transistors With P-gan Gate: Technology and Permentioning
confidence: 99%
“…The p-GaN technology already provided some impressive device results and could demonstrate safe and practically dispersion-free device operation up to 650 V. Similar to MIS-type and Schottkytype GaN HFETs, p-GaN HFETs of the 600-650 V class have demonstrated very low capacitances, gate charge and area-specific on-state resistances and outperform Si-based superjunction MOSFETs [24,34]. GaN power switching transistors showing significantly reduced dynamic on-state resistance normally rely on compensated (in many cases C-doped) buffer structures often in combination with ternary AlGaN layers [34][35][36]. The dynamic RON data for 400-600 V switching of p-GaN gate HFETs ( Figure 6) are competitive to values achieved with normally-on HFETs using MIS or Schottky-type gate modules [22,24].…”
Section: Normally-off Transistors With P-gan Gate: Technology and Permentioning
confidence: 99%
“…GaN HEMT is widely considered as a promising candidate for the next generation of power transistor [1]. Compared with Silicon MOSFET, GaN HEMT has a higher semiconductor band gap, which leads to lower onresistance, lower leakage current and higher operating temperature [2][3][4][5]. All these salient features enable the GaN HEMT's application in high frequency power conversion.…”
Section: Introductionmentioning
confidence: 99%
“…The increase in on-state resistance is highest immediately after the device is turned on and it returns to the rated resistance value after a certain time period. The magnitude and time constant of the increase has been shown to be dependent on both device design and operational parameters [2], [3], [4], [5].…”
Section: Introductionmentioning
confidence: 99%
“…The dynamic R DS,on adds a loss component which currently is not accounted for during the design phase. There are several authors who have investigated the phenomenon with operation parameters close to that in actual application [2], [3], [4], [5], [6], [7], [8]. Examples of operation parameters include bias voltage, device blocking time, current, and temperature variation.…”
Section: Introductionmentioning
confidence: 99%