2017
DOI: 10.3390/en10020153
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Technology and Reliability of Normally-Off GaN HEMTs with p-Type Gate

Abstract: Abstract:GaN-based transistors with p-GaN gate are commonly accepted as promising devices for application in power converters, thanks to the positive and stable threshold voltage, the low on-resistance and the high breakdown field. This paper reviews the most recent results on the technology and reliability of these devices by presenting original data. The first part of the paper describes the technological issues related to the development of a p-GaN gate, and the most promising solutions for minimizing the g… Show more

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Cited by 120 publications
(85 citation statements)
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“…[5]. According to Equations (5)- (7), the quantum coupling effect reaches the minimum under the effective electron mass matching condition that m à GaNÀz % m à GÀz , and thus the current reduction is least. This is consistent with the possibility of suppressing the current collapse with a p-GaN gate because it can meet the effective electron mass matching condition.…”
Section: Resultsmentioning
confidence: 99%
See 2 more Smart Citations
“…[5]. According to Equations (5)- (7), the quantum coupling effect reaches the minimum under the effective electron mass matching condition that m à GaNÀz % m à GÀz , and thus the current reduction is least. This is consistent with the possibility of suppressing the current collapse with a p-GaN gate because it can meet the effective electron mass matching condition.…”
Section: Resultsmentioning
confidence: 99%
“…This is consistent with the possibility of suppressing the current collapse with a p-GaN gate because it can meet the effective electron mass matching condition. [7] The current collapse is different for different gate materials because they have different effective mass. Note that the Schottky barrier heights of Pt and Au on GaN as 1.16, and 0.98 eV according to Ref.…”
Section: Resultsmentioning
confidence: 99%
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“…The injected holes are accumulated at the p-GaN/AlGaN interface. This lead to a negative shift in threshold voltage, which can also be observed in [16]. Recent studies [17] shows that using hydrogen plasma treatment instead of etching technology may compensate holes in the p-GaN layer above the two dimensional electron gas (2DEG) channel to release electrons in the 2DEG channel and form high resistivity area to reduce leakage current and increase threshold voltage stability.…”
Section: On-state Resistance (Rds(on))mentioning
confidence: 92%
“…In [12,13], the calculations for GaN HEMT losses, including switching losses, parasitic capacitance losses, etc., are presented. The reliability assessment of GaN HEMTs for power switching applications is given in [14,15]. In [14] an extensive analysis is provided on the physical mechanisms responsible for the failure of GaN HEMTs, and several critical characteristics are recommended to evaluate the electrical reliability of GaN HEMTs.…”
Section: Introductionmentioning
confidence: 99%