2004
DOI: 10.1109/jproc.2004.829024
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Materials modification using intense ion beams

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Cited by 98 publications
(33 citation statements)
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“…Ion irradiation of the samples with accelerated C + , n + and H + carbon ions (85% and 15%, respectively) was carried out with a TEMP-4M pulse accelerator [31,32] at a residual chamber pressure of 2 • 10 −2 Pa. Irradiation modes are the following: an accelerating voltage of 160 -200 keV, the pulse duration (at half maximum of the accelerating voltage) of the current was 100 ns, the current density in the pulse varied in the range 15 -85 А/cm 2 . Pulse repetition rate 8 s .…”
Section: Experimental Techniquementioning
confidence: 99%
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“…Ion irradiation of the samples with accelerated C + , n + and H + carbon ions (85% and 15%, respectively) was carried out with a TEMP-4M pulse accelerator [31,32] at a residual chamber pressure of 2 • 10 −2 Pa. Irradiation modes are the following: an accelerating voltage of 160 -200 keV, the pulse duration (at half maximum of the accelerating voltage) of the current was 100 ns, the current density in the pulse varied in the range 15 -85 А/cm 2 . Pulse repetition rate 8 s .…”
Section: Experimental Techniquementioning
confidence: 99%
“…The use of ceramics with gradient properties has great prospects, when the surface layer differs in its characteristics from the corresponding parameters of the bulk layers. As shown in works [11][12][13][14][15][16][17][18][19][20][21][22][23][24], surface treatment can be effectively carried out using low energy high current pulsed electron beam (LEHCPEB) [11][12][13], laser treatment [14,15] and high-power pulsed ion beam (HPPIB) [16][17][18][19][20][21][22][23][24]. To study thin modified layers of dielectrics, the method of secondary ion mass spectrometry [25][26][27] and the Rutherford backscattering method [28,29] have proved to be very useful.…”
Section: Introductionmentioning
confidence: 99%
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“…В частности, они поз воляют сохранять стехиометрический состав ве щества мишени в осаждаемых покрытиях, обес печивают их чистоту. При этом достигается до вольно большая площадь обработки (десятки квадратных сантиметров) и приемлемая произво дительность [1][2][3]. МИИП могут применяться и для осаждения биосовместимых кальций фосфат ных покрытий (КФ покрытий) на поверхность различных имплантатов, использующихся в сто матологии, травматологии и ортопедии [4][5][6].…”
Section: Introductionunclassified
“…Each ion beam pulse can lead to layer thicknesses from 1 to 100 nm over areas tens of cm 2 . Previous PIBD deposition experiments using RHEPP-1 [1] have yielded high-quality thin layers of fine-grain or amorphous microstructure, which in particular lacked the columnar structure seen on sputtered layers. This can be attributed in part to the high kinetic energy of the ablation plasma, estimated at tens of eV compared to fractions of an eV for plasmas formed by magnetron sputtering.…”
Section: Introductionmentioning
confidence: 99%