2020
DOI: 10.1016/j.ceramint.2020.05.263
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Material removal and wear mechanism in abrasive polishing of SiO2/SiC using molecular dynamics

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Cited by 38 publications
(14 citation statements)
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“…Therefore, this report surveys the effect of substrate temperature from 300 to 1200 K on the machining process. Ordinarily, most studies decide to choose a perfectly flat surface 36 38 , a rough surface 39 41 , or a surface covered by a thin amorphous/oxidation layer 42 44 to investigate the tribological properties. This report tries to examine both a perfect flat surface and a deformed surface by machining for one time or multi-times, as shown in Fig.…”
Section: Methodsmentioning
confidence: 99%
“…Therefore, this report surveys the effect of substrate temperature from 300 to 1200 K on the machining process. Ordinarily, most studies decide to choose a perfectly flat surface 36 38 , a rough surface 39 41 , or a surface covered by a thin amorphous/oxidation layer 42 44 to investigate the tribological properties. This report tries to examine both a perfect flat surface and a deformed surface by machining for one time or multi-times, as shown in Fig.…”
Section: Methodsmentioning
confidence: 99%
“…This leads to a decrease in MRR at higher polishing speed, indicating that blindly increasing the polishing speed cannot achieve a higher MRR [48], which is inconsistent with the report of Li et al [49] where the stacking height was reduced, but the MRR consistently improved with increasing polishing speed. Many studies [14,31,50] regions is caused by thermal activation as the part of work done by the cutting and extrusion process of the abrasive is converted into internal energy [51]. Besides, after polishing, some atoms suffering elastic deformation can recover to their original structure, which indicates that the amorphous phase transition of Invar is partially reversible [19,52].…”
Section: Effect Of Polishing Speedmentioning
confidence: 99%
“…During the second planetary motion, Gillespie et al [9] and Holzknecht et al [10] were measured the final surface quality and material removal rate (MRR) by the abrasive dynamics and the initial surface roughness of the workpiece. Nguyen et al [11] was studied Silicon carbide (SiC) abrasive, which has stable chemical properties, high thermal conductivity, low thermal expansion coefficient, good wear resistance, and can be used as abrasive medium. Quartz, the main chemical component of is SiO2, which is an inorganic substance with very stable physical and chemical properties.…”
Section: Introductionmentioning
confidence: 99%