Mass-transport fabrication of off-axis and prismatic gallium phosphide optics

Ballen, Todd A.; Leger, James R.

doi:10.1364/ao.38.002979

Cited by 7 publications

(1 citation statement)

References 13 publications

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“…In [9,10] mass transport was done with micrometer-sized multilevel structures. Prismatic gallium phosphide optics with smooth sidewalls and 8.2 μm high, 100 μm long slopes (with 4.7 • angle) were created from five 1.6 μm high, 20 μm wide steps.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of 3D nanoimprint stamps with continuous reliefs using dose-modulated electron beam lithography and thermal reflow

Schleunitz¹,

Schift²

2010

J. Micromech. Microeng.

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3D electron beam lithography and thermal reflow were combined to fabricate structures with multilevel and continuous profiles. New shapes, smooth surfaces and sharp corners were achieved. By using exposure with variable doses, up to 20 steps were fabricated in a 500 nm thick resist with a lateral resolution of 200 nm. Steps were reflowed into continuous slopes by thermal post-processing, and were transferred into silicon substrates by proportional plasma etching. The method can be used for the fabrication of 3D nanoimprint stamps with both sharp features and continuous profiles.

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Section: Introductionmentioning

confidence: 99%

Fabrication of 3D nanoimprint stamps with continuous reliefs using dose-modulated electron beam lithography and thermal reflow

Schleunitz¹,

Schift²

2010

J. Micromech. Microeng.

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Mass transport: semiconductor microstructure fabrication by surface energy

Liau

2003

Materials Science and Engineering: R: Reports

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Fabrication of large-sag aspheric micro-optics with nanometer accuracy using electron-beam lithography on curved substrates

Yang

Leger

2006

Opt. Eng

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Smooth patterns were written into PMGI electron-beam resist using electron-beam lithography on BK7 blank concave mirror substrates, resulting in aspheric optics with sag as large as 4 m. Interference microscope measurements revealed that the fabricated optics had height accuracy of 10 nm. These optics were designed for flattop mode shaping in laser resonators. Excellent performance of these optics has been demonstrated by testing them as fixed phase-conjugate mirrors outside laser resonators, as well as mode-shaping mirrors within laser resonators.

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Mass-transport fabrication of off-axis and prismatic gallium phosphide optics

Cited by 7 publications

References 13 publications

Fabrication of 3D nanoimprint stamps with continuous reliefs using dose-modulated electron beam lithography and thermal reflow

Fabrication of 3D nanoimprint stamps with continuous reliefs using dose-modulated electron beam lithography and thermal reflow

Mass transport: semiconductor microstructure fabrication by surface energy

Fabrication of large-sag aspheric micro-optics with nanometer accuracy using electron-beam lithography on curved substrates

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