Mass spectrometry diagnostics of short-pulsed HiPIMS discharges

Palmucci, Maria; Britun, Nikolay; Silva, Tiago; Snyders, Rony; Konstantinidis, Stéphanos

doi:10.1088/0022-3727/46/21/215201

Cited by 45 publications

(46 citation statements)

References 46 publications

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“…A similar behaviour is observed for Ti 2+ . Such a HE peak is very distinct from the LE peak and has already been found by several groups [11,21,34,14]. Its origin is a matter of the current debate and has been explained by several mechanisms:…”

Section: +mentioning

confidence: 62%

“…-Reflected ions at the target: Palmucci et al [14] observed similar distinct peaks in the Ti + energy distribution for 5 µs HiPIMS pulses with a maximum current of almost 200 A and a voltage of 1200 V. They speculate that these ions originate from reflected ions at the target. Such a reflection, however, occurs with a probability of typically only 1%.…”

Section: +mentioning

confidence: 82%

“…As a consequence, any physical model for the explanation of these two distinct peaks needs to provide two distinct generation mechanisms for the LE and HE peak, which take place simultaneously. This constraint for a physical model was not so stringent before, because most of the IEDF data in the literature were time-integrated or exhibited a rather poor temporal resolution [11,21,34,14]. The observation of HE peaks in those data could always be explained by a peculiar dynamic of the HiPIMS pulse leading to different energies at different times during the pulse.…”

Section: +mentioning

confidence: 99%

“…Several mechanisms have been proposed to explain the presence of energetic metal species in HiPIMS: i) reflected ions at the target [14]; ii) the high energy tail of the Thompson distribution [10]; iii) negative ions that are generated in front of the target surface that are accelerated towards the substrate by the full target potential [18,19,20]; iv) acceleration of metal species by a two-stream instability induced by localized ionization zones on the target [21]. Fast optical diagnostics revealed a pattern formation in HiPIMS plasmas, namely the formation of localized ionization zones or so called spokes [22,23].…”

Section: Introductionmentioning

confidence: 99%

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Origin of the energetic ions at the substrate generated during high power pulsed magnetron sputtering of titanium

Maszl

Breilmann

Benedikt

et al. 2014

J. Phys. D: Appl. Phys.

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Abstract. High power impulse magnetron sputtering (HiPIMS) plasmas generate energetic metal ions at the substrate as a major difference to conventional direct current magnetron sputtering (dcMS). The origin of these very energetic ions in HiPIMS is still an open issue, which is unraveled by using two fast diagnostics: time resolved mass spectrometry with a temporal resolution of 2 µs and phase resolved optical emission spectroscopy with a temporal resolution of 1 µs. A power scan from dcMS-like to HiPIMS plasmas was performed, with a 2-inch magnetron and a titanium target as sputter source and argon as working gas. Clear differences in the transport as well in the energetic properties of Ar + , Ar 2+ , Ti + and Ti 2+ were observed. For discharges with highest peak power densities a high energetic group of Ti + and Ti 2+ could be identified with energies of approximately 25 eV and of 50 eV, respectively. A cold group of ions is always present. It is found that hot ions are observed only, when the plasma enters the spokes regime, which can be monitored by oscillations in the IV-characteristics in the MHz range that are picked up by the used VI-probes. These oscillations are correlated with the spokes phenomenon and are explained as an amplification of the Hall current inside the spokes as hot ionization zones. To explain the presence of energetic ions, we propose a double layer (DL) confining the hot plasma inside a spoke: if an atom becomes ionized inside the spokes region it is accelerated because of the DL to higher energies whereas its energy remains unchanged if it is ionized outside. In applying this DL model to our measurements the observed phenomena as well as several measurements from other groups can be explained. Only if spokes and a double layer are present the confined particles can gain enough energy to leave the magnetic trap. We conclude from our findings that the spoke phenomenon represents the essence of HiPIMS plasmas, explaining their good performance for material synthesis applications. ‡

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Section: +mentioning

confidence: 62%

Section: +mentioning

confidence: 82%

Section: +mentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Origin of the energetic ions at the substrate generated during high power pulsed magnetron sputtering of titanium

Maszl

Breilmann

Benedikt

et al. 2014

J. Phys. D: Appl. Phys.

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“…13) [172]. The clear nonThompson part of the IEDF is universally observed, including for HiPIMS discharges of short duration [173].…”

Section: Pulsed Plasma Production By Hipimsmentioning

confidence: 91%

A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

Anders

2014

Surface and Coatings Technology

222

109

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High power impulse magnetron sputtering (HiPIMS) has been in the center of attention over the last years as it is an emerging physical vapor deposition (PVD) technology that combines advantages of magnetron sputtering with various forms of energetic deposition of films such as ion plating and cathodic arc plasma deposition. It should not come at a surprise that many extension and variations of HiPIMS make use, intentionally or unintentionally, of previously discovered approaches to film processing such as substrate surface preparation by metal ion sputtering and phased biasing for film texture and stress control. Therefore, in this review, an overview is given on some historical developments and features of cathodic arc and HiPIMS plasmas, showing commonalities and differences. To limit the scope, emphasis is put on plasma properties, as opposed to surveying the vast literature on specific film materials and their properties.

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An Overview on Time‐Resolved Optical Analysis of HiPIMS Discharge

Britun

Konstantinidis

Snyders

2015

Plasma Processes & Polymers

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The progress in the time-resolved characterization of HiPIMS discharges performed during the last decade in our group is overviewed. Optical emission and absorption spectroscopy, as well as laser-induced fluorescence-based techniques have been mainly utilized. The results covering such important aspects of the HiPIMS discharge as the density evolution of the discharge species, their ionization and excitation, propagation of secondary electrons in the discharge volume, dynamics of velocity distribution of the discharge species, gas rarefaction, etc. are discussed.

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Mass spectrometry diagnostics of short-pulsed HiPIMS discharges

Cited by 45 publications

References 46 publications

Origin of the energetic ions at the substrate generated during high power pulsed magnetron sputtering of titanium

Origin of the energetic ions at the substrate generated during high power pulsed magnetron sputtering of titanium

A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

An Overview on Time‐Resolved Optical Analysis of HiPIMS Discharge

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