Manufacturing and characterisation of MEMS test nanostructures

Application of Scattering Parameters to DPL Time-Lag Parameter Estimation at Nanoscale in Modern Integration Circuit Structures

“…The DPL model was verified using a dedicated test structure containing a 104 nm thin silicon oxide layer (SiO 2 : ε r = 3.9 [44,45], we assume a constant value up-to 13.5 GHz based on [46]; tan δ = 0.0002 [47]) placed between two platinum resistors (the top resistor: Pt: W top = 2.75 µm, thickness h = 150 nm, length L = 460 µm, resistance R top = 155 Ω at 20 • C [39,48,49]; the bottom resistor: Pt, W bottom = 4.96 µm, thickness h = 150 nm, length L = 460 µm, resistance R bottom = 262.3 Ω at 20 • C [39,48,49]). Generally, each resistor could be used either as a heat source line or a temperature sensor.…”

“…These elements are placed on a 100 nm wide silicon dioxide (SiO 2 ) layer stacked on a 400 µm thick silicon layer. The test structure presented in Figure 1c was manufactured in MEMS technology by the Institute of Electron Technology (ITE) in Warsaw, Poland [39][40][41][42][43][44][45]. The bottom and upper resistor dependence on temperature and their temperature rise dependence on heating power were measured and characterised in [39,40].…”

“…The test structure presented in Figure 1c was manufactured in MEMS technology by the Institute of Electron Technology (ITE) in Warsaw, Poland [39][40][41][42][43][44][45]. The bottom and upper resistor dependence on temperature and their temperature rise dependence on heating power were measured and characterised in [39,40]. The entire structure is bonded to a metal copper foil on a PCB test board (Figure 1a…”

“…Acknowledgments: The authors would like to express their special thanks to M. Janicki and J. Topilko for sharing papers [39,40] and [43][44][45].…”

“…However, the test probes used for this purpose should be prepared not exactly like real structures in ICs and MEMSs. The first investigation of the dual-phase time-lag parameters estimation using dedicated MEMS structures with a measurement system implemented on a PCB was depicted in [39][40][41][42][43]. The authors of this paper propose the scattering wave parameters presented in [2] to extract the value of the dual-phase time-lag parameter τ T .…”