Manufacture of diffractive optical elements by cutting on numerically controlled machine tools

Абульханов, С. Р.; Казанский, Н. Л.; Doskolovich, Leonid L.; Kazakova, O. Yu.

doi:10.3103/s1068798x11120033

Cited by 56 publications

(14 citation statements)

References 2 publications

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“…Reduction of the characteristic dimensions of the diffractive microrelief [19][20][21][22] to create a DOE with a smaller focal lengths, with a larger aperture, or DOE, is designed to lower the working wavelength. Of course, the proposed improvements are not suitable for everyone [23][24][25] technological approaches, but can be effectively used for a wide range [3][4][5][6][7][8][9][10][11] …”

Section: Resultsmentioning

confidence: 99%

Laser ablation of thin films of molybdenum for the fabrication of contact masks elements of diffractive optics with high resolution

Полетаев¹

2015

Collection of Selected Papers of the I International Conference on Information Technology and Nanotechnology

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Abstract.Considered the task of reducing the thickness of the contact lines of the pattern masks used in the formation of the microrelief of diffractive optical elements (DOE) and produced by laser ablation of thin films of refractory metals. For contact mask of DOEs on molybdenum films with thickness of 40 nm using a laser ablation patterns recorded with elements of the picture width 0.25-0.3 µm. This is approximately 3 times smaller than the characteristic dimensions, obtained by thermochemical recording chromium films of the same thickness in the standard process. Reactive ion etching in an inductively coupled plasma through a mask was formed micro-relief height up to 300 nm in a quartz substrate. We have shown promising applications of thin films of molybdenum as a metallic mask in the formation of microrelief of DOEs. ─ The creation of metallic liquid etching mask film of chromium areas not exposed to laser radiation; ─ Plasma etching the substrate through the resulting metallic mask (the formation of microrelief in the substrate).The disadvantage of this technology is pretty low resolution. Standard achievable feature size structures in this case -the order of the wavelength, i.e. about 0.8 μm [10]. In this regard, the actual task is the development of technological methods for creating elements with high spatial resolution.On the basis of the above-described process sequence, for example, in [11], there has been an element size of 0.5 μm on the structure of the chromium films 50 nm thick inflicted thermal vacuum process substrates of optical glass.Patent [12] describes how to increase the resolution of the method of laser thermochemical oxidation film of titanium thickness of 3 -60 nm, deposited on the glass substrate.A characteristic feature of the studies described in [1][2][3][4][5][6][7][8][9][10][11], is that the resistance to the subsequent chemical resistance increases for portions of film exposed to the laser radiation. In contrast to [1][2][3][4][5][6][7][8][9][10][11], we propose an approach based on evaporation (ablation) portions of the film exposed to laser radiation.The purpose of this paper is the experimental investigation of the possibility of further increasing the spatial resolution diffraction microrelief formed by using the contact masks using laser recording. It is proposed to achieve this total rejection of liquid chemical processes of lithography through the use of new materials and other physical effects of producing binary microstructures. Problem statement and proposed approachIn [13] have demonstrated the possibility of ablation of molybdenum films picosecond laser beam with a wavelength of 1064 nm, deposited on a sublayer of silicon nitride thickness of about 140 nm. The grounds were glass substrate of a thickness of 3 mm. Ablation of the films of molybdenum with a thickness of about 0.5 μm was carried out by laser beam with a maximum energy flux density of 260 W/cm 2 , and it was suggested that the molybdenum is removed from the substrate surface without chemical transformati...

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Section: Resultsmentioning

confidence: 99%

Laser ablation of thin films of molybdenum for the fabrication of contact masks elements of diffractive optics with high resolution

Полетаев¹

2015

Collection of Selected Papers of the I International Conference on Information Technology and Nanotechnology

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“…Unfortunately, asymptotic methods do not allow us to analyze different methods for manufacturing micro-relief of diffractive optical elements [29][30][31][32][33][34][35][36]. Such a study is necessary to select the most appropriate technology for manufacturing DOEs intended for solving a particular problem.…”

Section: Focusators Researchmentioning

confidence: 99%

Asymptotic research in computer optics

Kazanskiy¹

2015

Collection of Selected Papers of the I International Conference on Information Technology and Nanotechnology

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“…Fabrication results after each unit process step have been presented and also the SEM images of the final released structure. Technology of computer optics [5][6][7][8][9][10][11][12] is unable to provide the required parameters of MEMSstructures.…”

Section: Fig 1 Solid Model Of the Devicementioning

confidence: 99%

Su-8 Based Uv-Liga Fabrication Process for Realization of Nickel Based Mems Inertial Sensor

Verma

Khan²,

Fomchenkov

et al. 2016

Collection of Selected Papers of the II International Conference on Information Technology and Nanotechnology

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Abstract. This paper reports the complete fabrication process flow based on UV-LIGA technology for realization of metal based MEMS inertial sensor. In this process, nickel is used as the structural layer and copper as the sacrificial layer. The economical three mask process has been optimized and the detailed step by step procedure for carrying out the fabrication is presented. The optimized process parameters to achieve void free copper and nickel electroplated layers with extremely low roughness have been reported. Footing problem associated with lithography process has been analysed and its solution discussed. The fabrication results after each process step have been presented and discussed. Scanning electron micrograph images of the released prototype inertial sensor devices have been presented to demonstrate the successful fabrication of the prototypes using the economical UV-LIGA process. Keywords: MEMS, UV-LIGA, SU-8 2010, Cu and Ni electroplatingCitation: Verma Payal, Zaman Khan K, Fomchenkov SA, Gopal R. SU-8 based UV-LIGA fabrication process for realization of nickel based MEMS inertial sensor.

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Manufacture of diffractive optical elements by cutting on numerically controlled machine tools

Cited by 56 publications

References 2 publications

Laser ablation of thin films of molybdenum for the fabrication of contact masks elements of diffractive optics with high resolution

Laser ablation of thin films of molybdenum for the fabrication of contact masks elements of diffractive optics with high resolution

Asymptotic research in computer optics

Su-8 Based Uv-Liga Fabrication Process for Realization of Nickel Based Mems Inertial Sensor

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