Manganese oxide thin-films for current-signal sensing and thermal insulation

Structural and optical properties of manganese oxide thin films deposited by pulsed laser deposition at different substrate temperatures

“…The growth of manganese oxide as a thin film requires optim ization of the chosen phase and valency to make it useful for different applications. Diverse growth techniques have been used by scientists for manganese oxide such as atomic layer deposition [9,10], spray pyrolysis [8,[11][12][13], sol-gel [7], thermal evaporation [2], RF magnetron sputtering [14], high-vacuum evaporation and thermal oxidation process [15], as well as pulsed laser deposition (PLD) [1,4,5]. PLD is found to be the best technique to fabricate oxide thin films, because of its flexibility (changing deposition parameters such as temper ature, background gas, gas pressure, target to substrate distance, laser energy, and laser fluence) and cost efficiency.…”

Effect of Annealing Process on the Morphological, Optical and Electrical Properties of Cu:MnO Films Prepared by PLD Technique

“…The compound manganese oxide has garnered significant attention from researchers, leading to several research endeavours [9,10]. Manganese oxide and manganese oxide nanoparticles have been synthesized via a variety of techniques, including spray pyrolysis [11], sol-gel [12], atomic layer deposition [13], thermal evaporation [14][15][16], pulsed laser deposition [17][18][19], RF magnetron sputtering [20,21], metal-organic chemical vapor deposition [22], and electron beam technique followed by archiving post-treatment [23]. Nelson et al [24] studied the impact of deposition temperature and substrate on the formation of manganese oxide thin films using ALD (Atomic Layer Deposition).…”

Nano-Structural Characteristics and Optical and Electrical Properties of Obliquely Deposited Manganese Oxide Thin Films

“…Manganese is a transition metal which has multiple potential oxidation states such as MnO, MnO2, and Mn2O3. Manganese oxide (MnO) is one of the oxide states attracted many applications in industry due to the facility synthesis, inexpensive, nontoxic and semiconductor properties [1][2][3] Manganese oxide used in electrode material [4], current signal sensing and thermal insulation [5], rechargeable micro-batteries [1,6], supercapacitors [2,3], electrochemical capacitors and sensors [7], magneto-electronic devices [3], gas and screen-printed sensor [6,8,9], and catalysts in chemical reactions [9]. In nowadays, manganese oxide thin films absorb much attention in optoelectronic applications because of their bandgap in visible region [1,3,[10][11][12][13].…”

“…Hence, fabrication technique and growth conditions are essential in the production of nanostructures. Diverse physical and chemical deposition techniques have been used for synthesis manganese oxide such as spray pyrolysis [13], sol-gel [15], atomic layer deposition [12], thermal evaporation [5,9,12], pulsed laser deposition [1,2,16], RF magnetron sputtering [17,18], metal-organic chemical vapor deposition [19], and electron beam technique followed by annealing post-treatment [20]. Nelson et al have created manganese oxide thin films by ALD (Atomic layer deposition), and they studied the effects of the deposition temperature and substrate [10].…”