Effect of Annealing Process on the Morphological, Optical and Electrical Properties of Cu:MnO Films Prepared by PLD Technique
Doaa T. Mohammed,
Ghuson H. Mohammed
Abstract:In this study, Nd:YAG laser pulses with a wavelength of 1064 nm, a power of 500 mJ, a pulse width of 9 ns, and a repetition frequency of 6 Hz were used to hit a manganese oxide (MnO) target surface 300 times. Pure MnO and copper Cu-doped MnO (Cu:MnO) with different amounts of Cu (0.03, 0.05, 0.07, and 0.09 wt%) produced by PLD were studied. Cu:MnO thin films were annealed at 473 K, and their morphological, optical, and electrical characteristics were studied. The results of the atomic force microscopic (AFM) i… Show more
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