Maleic anhydride film deposition through an active screen plasma system

Abstract

The active screen plasma system has been extensively studied over the past few years, mainly for plasma nitriding purposes. This technique also provides possibilities of treating non-electrical conducting materials, such as polymeric ones, which is unattainable with a conventional DC plasma system. In this work, an active screen plasma setup for maleic anhydride (MA) film deposition on a glass substrate was used. The plasma working gas was a mixture of argon and MA vapour. Films obtained through conventional plasma discharge were compared with the active screen deposition process, in both DC and pulsed-mode plasma. The samples were characterized through Fourier-transform infrared spectroscopy and static contact angle between the film's surface and droplets of distilled water. Film thickness measurements were performed through profilometry. Results showed that MA films obtained through the active screen system are thicker and more efficiently preserve the anhydride groups than those obtained from conventional plasma discharge.

Confined Crystallization of Thin Plasma-Polymerized Nanocomposite Films with Maleic Anhydride and Cellulose Nanocrystals under Hydrolysis

“…Maleic anhydride (MA) is a multifunctional and biocompatible polymer that can be deposited by plasma polymerization [ 12 ]. In order to maximize the retention of functional groups in plasma-polymerized p(MA) films, a critical balance of plasma parameters should be selected with low nominal power or low pulsing times [ 13 , 14 , 15 ]. The film formation is governed by gas-phase dissociation and growth processes, which need to be narrowly controlled in parallel with complex interactions in the plasma reactor [ 16 , 17 ].…”

Plasma polymer for enhancing adhesion bonds of a metal/elastomer assembly

“…The pulsed plasma polymerization of three different precursors (acetylene [Ac], acrylic acid [AA], maleic anhydride [MA]) was shown to be a promising method, and the chemical retention depends on the plasma chamber. [3,4,[18][19][20][21][22][23] Their corresponding plasma polymers adhered onto various substrates, mostly metallic ones for the pp-Ac [24][25][26] and polymeric ones for the other two precursors. [27,28] Therefore, here, the study was extended to other plasma parameters alone or combined (pulsed or continuous wave at different discharge powers, durations, etc.)…”

Evaluation of Corrosion Resistance of Thin Films Formed on AISI 316L Steel by Plasma Using Hastelloy as Cathodic Cage

“…Plasma deposition procedure is a promising technique that can be used to supply thin films, aiming at applications such as magnetron sputtering, [ 2,3,6,10,12,18,35–37 ] hollow cathode, [ 41,42 ] active screen, [ 43–45 ] and plasma electrolytic. [ 37,46–50 ] The cathodic cage deposition process has been used for the deposition of thin films with improved physical–chemical properties with well‐defined compositions such as iron nitride, [ 51–53 ] titanium nitride, [ 54–57 ] titanium oxide, [ 58 ] copper oxide, [ 59–61 ] and molybdenum nitride.…”