Magnetron sputtered carbon nitride films

Kola, P.V.; Cameron, D.C.; Hashmi, M.S.J.

doi:10.1016/0257-8972(94)90158-9

Search citation statements

Order By: Relevance

Paper Sections

Select...

Infrared Absorption Spectroscopy1

Citation Types

Supporting

Mentioning

Contrasting

Year Published

1995

1999

Publication Types

Select...

Article5

Book1

Relationship

Self Cite0

Independent6

Authors

Journals

Cited by 16 publications

(1 citation statement)

References 16 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…2 spectrum is similar to those obtained by using other techniques [3,16,18,19]. For the sample under discussion a refractive index n = 3 and a thickness d = 1.14 pm have been deduced from the interference pattern at 4000-5000 cm-'.…”

Section: Infrared Absorption Spectroscopysupporting

confidence: 64%

Carbon nitride thin films prepared by a capacitively coupled RF plasma jet

Dinescu¹,

Aldea²,

Boieriu³

et al. 1996

Nuclear Instruments and Methods in Physics Research Section B:

View full text Add to dashboard Cite

Carbon nitride thin films have been downstream deposited from a nitrogen plasma beam sustained by a capacitively coupled discharge generated between a RF powered carbon electrode and a grounded carbon nozzle. The spectral emission of the plasma jet strongly exhibits the CN radical emission indicating that the deposition takes place via a mechanism involving the CN radical. The deposition process is enhanced by DC biasing the powered electrode. The films have been investigated by X-ray diffraction, infrared absorption spectroscopy and X-ray photoelectron spectroscopy. The results show that the films are amorphous and contain in a large extent carbon nitrogen bonds.

show abstract

Section: Infrared Absorption Spectroscopysupporting

confidence: 64%