2016
DOI: 10.1063/1.4943769
|View full text |Cite
|
Sign up to set email alerts
|

Magneto-transport and domain wall scattering in epitaxy L1 MnAl thin film

Abstract: Epitaxial L1 0 MnAl films demonstrated two different kinds of magneto-transport behaviors as a function of temperature. The magneto-resistance ratio (MR) was negative and exhibited evident enhancement in the resistivity at coercive fields above ~175 K. The MR enhancement was attributed to the increase of the magnetic domain walls based on the quantitative correlation between the domain density and the resistivity. Below 175 K, the MR was positive and showed a quadratic dependence on the external magnetic field… Show more

Help me understand this report
View preprint versions

Search citation statements

Order By: Relevance

Paper Sections

Select...
4

Citation Types

1
9
0

Year Published

2017
2017
2023
2023

Publication Types

Select...
5

Relationship

1
4

Authors

Journals

citations
Cited by 12 publications
(10 citation statements)
references
References 38 publications
(49 reference statements)
1
9
0
Order By: Relevance
“…The deposition details can be found elsewhere. [15] The complete structure of the multilayer is SiO 2 (substrate)/20nm Ru/2.2nm Co 90 Fe 10 (reference layer)/5nm Cu/6.5nm Ni 80 Fe 20 (free layer)/5nm Ru/Ti 5nm/Au 25nm. A magnetoresistance (MR) of ~1.2% was measured in the pseudo spin-valve continuous film using current-in-plane method before the patterning process [ Fig.…”
mentioning
confidence: 99%
“…The deposition details can be found elsewhere. [15] The complete structure of the multilayer is SiO 2 (substrate)/20nm Ru/2.2nm Co 90 Fe 10 (reference layer)/5nm Cu/6.5nm Ni 80 Fe 20 (free layer)/5nm Ru/Ti 5nm/Au 25nm. A magnetoresistance (MR) of ~1.2% was measured in the pseudo spin-valve continuous film using current-in-plane method before the patterning process [ Fig.…”
mentioning
confidence: 99%
“…Both intrinsic MR near T C and low‐field (LF) MR, occuring due to the existance of interfaces and grain boundaries (GBs), are observed in diversified manganite‐based composite materials . Furthermore, the sign of MR has been found to be reversed in different systems such as La 0.7 Ca 0.3 MnO 3 /SrTiO 3 ultrathin films, La 0.7− x Pr x Ca 0.3 MnO 3 thin films, and magnetic tunnel junctions . Different physical phenomena such as spin flipping of tunneling electrons, surface anisotropy, and pinning of conduction electron spins at defect sites have been found to be responsible for such reversal of MR in the aforementioned systems.…”
Section: Introductionmentioning
confidence: 99%
“…Different physical phenomena such as spin flipping of tunneling electrons, surface anisotropy, and pinning of conduction electron spins at defect sites have been found to be responsible for such reversal of MR in the aforementioned systems. Moreover, several analytical models have been proposed in this direction . For instance, in a model proposed by Sapkota et al, the combined effect of quantum correction to carrier conductivity and bound magnetic polarons has been considered to explain MR sign reversal in Mn‐doped ZnO nanowires.…”
Section: Introductionmentioning
confidence: 99%
“…MnAl alloy have L10ordered structure in the compositional range of about 50−60 at. % Mn [6,7], and exhibits a large Ku (> 1 × 10 7 erg/cm 3 ), low α (~0.006), and relatively small MS (< 600 emu/cm 3 ), which are extremely desirable for an STT application [8][9][10][11][12]. In addition, a tunneling magnetoresistance (TMR) effect with a TMR ratio of 2% at room temperature (RT) was experimentally demonstrated in MTJs with an MnAl electrode [13].…”
Section: Introductionmentioning
confidence: 99%
“…In this regard, it is also necessary to choose a suitable underlayer, such as one with a small in-plane lattice mismatch (∆f), good wettability, and less interfacial reaction, to realize high quality L10-MnAl films. Moreover, although there have been many studies regarding the fabrication of L10-MnAl films on several underlayers, for example, GaAs, Cr, TiN, and MgO [8][9][10][11][12], the growth of L10-MnAl films on an underlayer with ∆f < 1% has yet to be attempted.…”
Section: Introductionmentioning
confidence: 99%