Magnetization reduction due to oxygen contamination of bias sputtered Fe/sub 35/Co/sub 65/ thin films

Yu, Winnie; Bain, J.A.; Peng, Yingguo; Laughlin, David E.

doi:10.1109/tmag.2002.802126

Cited by 13 publications

(6 citation statements)

References 3 publications

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“…The coercivities of CoFeNi films plated from the newly developed bath are lower than those for CoFe films obtained with vacuum techniques for recording head fabrication, which are around 20 to 60 Oe. 4,6 The optimal soft magnetic properties of CoFeNi thin films can be achieved only by optimizing their chemical composition, phase formation, grain sizes, and electroplating process.…”

Section: Effect Of On-time (T On )mentioning

confidence: 99%

“…With increasing storage density, the need for recording heads to write on high-coercivity media at high frequencies has raised new requirements for the write-head material that cannot be met by Ni 80 Fe 20 . New soft magnetic materials with higher saturation flux density B s such as electroplated CoFe alloys, − CoFeNi alloys, − CoFeCu alloys, ,− other CoFe-based alloys, − sputtered FeN films, , and other Fe-based alloys 43-45 have been developed.…”

Section: Introductionmentioning

confidence: 99%

“…2 With increasing storage density, the need for recording heads to write on high-coercivity media at high frequencies has raised new requirements for the write-head material that cannot be met by Ni 80 Fe 20 . 3 New soft magnetic materials with higher saturation flux density B s such as electroplated CoFe alloys, [4][5][6] CoFeNi alloys, Co-FeCu alloys, 3,[35][36][37] other CoFe-based alloys, [38][39][40] sputtered FeN films, 41,42 and other Fe-based alloys [43][44][45] have been developed. Electroplating processes have major significance in the fabrication of thin-film recording heads with the advantages of simplicity, high cost-effectiveness, and controllable patterning.…”

Section: Introductionmentioning

confidence: 99%

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Electroplating of Nanocrystalline CoFeNi Soft Magnetic Thin Films from a Stable Citrate-Based Bath

Zhang

Ivey

2004

Chem. Mater.

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CoFeNi alloys are some of the most studied soft magnetic materials because of their superior properties over FeNi alloys as write head core materials in hard-disk-drives. Electroplating processes have major significance in the fabrication of thin-film recording heads due to their advantages of simplicity, cost-effectiveness, and controllable patterning. Conventional low pH (2.5-3.0) baths suffer from problems such as poor stability, low current density efficiency, and voids in deposited films due to the electroplating of hydrogen. A new, stable citrate-based bath has been developed in this study. Citrate can effectively improve the stability of CoFeNi plating baths, and denser CoFeNi films can be plated out because of the higher bath pH (>5). The effects of bath composition and plating conditions on the electroplating of CoFeNi thin films have been studied. CoFeNi thin films with preferred composition, mixed fcc-bcc phases, and 10-20 nm grain sizes have been plated out from the new citrate-based bath.

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Section: Effect Of On-time (T On )mentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Electroplating of Nanocrystalline CoFeNi Soft Magnetic Thin Films from a Stable Citrate-Based Bath

Zhang

Ivey

2004

Chem. Mater.

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“…It is known that amorphous iron can suffer a large reduction in [7], which would account for the lower observed in the small grain samples (A1, A2). An alternative explanation is that the amorphous material between the grains is more susceptible to oxidation [8]. However, oxide layers would be expected to increase Hc, which does not occur.…”

Section: Resultsmentioning

confidence: 99%

Growth rate effects in soft CoFe films

Vopsaroiu¹,

Georgieva²,

Grundy³

et al. 2005

INTERMAG Asia 2005. Digests of the IEEE International Magnetics Conference, 2005.

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We report on growth rate effects in sputter-deposited CoFe films prepared using high target utilization sputtering technology (HiTUS). We find that the grain structure of these polycrystalline films is closely related to the growth rate. By changing the growth rate, samples were prepared with different grain structure, which in turn had the effect of changing the magnetic properties of the films. We demonstrate control of the coercivity, which varied by a factor of more than ten. This was achieved via grain size control in CoFe films of thickness 20 nm. Furthermore, by employing a two-step sputtering process, in which two extreme growth rates are used sequentially, we were able to tune the saturation magnetization.Index Terms-Control of and in CoFe films, grain size effects, high moment soft CoFe films, high target utilization sputtering technology (HiTUS).

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“…Soft magnetic films with high moment are also widely used in modern electromagnetic devices, such as high-frequency field-amplifying components, versatile communication tools, and magnetic shielding materials in tuners [4]. Although numerous soft or high-B s magnetic films have been achieved nowadays via sputtering, evaporation, and casting, most of them cannot be applied to device fabrication due to the following reasons: low-deposition rate (usually <8Å/S) and high-internal stress films from sputtering [5], overly thick films (commonly > 1 mm) from casting, and coarse-grained films from evaporation [6]. In addition, most of the reported materials have limited B s of ≤2.1T (e.g., NiFe, FeCoNi films) [3].…”

Section: Introductionmentioning

confidence: 99%

Ultrasoft and High Magnetic Moment CoFe Films Directly Electrodeposited from a B-Reducer Contained Solution

Zong

Han

Qiu

et al. 2008

Research Letters in Physical Chemistry

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A methodology to fabricate ultrasoft CoFe nano-/microfilms directly via electrodeposition from a semineutral iron sulfate solution is demonstrated. Using boron-reducer as the additive, the CoFe films become very soft with high magnetic moment. Typically, the film coercivity in the easy and hard axes is 6.5 and 2.5 Oersted, respectively, with a saturation polarization up to an average of 2.45 Tesla. Despite the softness, these shining and smooth films still display a high-anisotropic field of ~45 Oersted with permeability up to 104. This kind of films can potentially be used in current and future magnetic recording systems as well as microelectronic and biotechnological devices.

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Magnetization reduction due to oxygen contamination of bias sputtered Fe/sub 35/Co/sub 65/ thin films

Cited by 13 publications

References 3 publications

Electroplating of Nanocrystalline CoFeNi Soft Magnetic Thin Films from a Stable Citrate-Based Bath

Electroplating of Nanocrystalline CoFeNi Soft Magnetic Thin Films from a Stable Citrate-Based Bath

Growth rate effects in soft CoFe films

Ultrasoft and High Magnetic Moment CoFe Films Directly Electrodeposited from a B-Reducer Contained Solution

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