Magnetic nanodot arrays produced by direct laser interference lithography

Zheng, Min; Yu, M.; Liu, Yi; Skomski, Ralph; Liou, Sy‐Hwang; Sellmyer, David J.; Petryakov, V N; Verevkin, Yu K; Polushkin, N. I.; Салащенко, Н. Н.

doi:10.1063/1.1409948

Cited by 81 publications

(58 citation statements)

References 17 publications

(28 reference statements)

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“…For several decades, nanoparticles where made from soft or semihard materials and had more or less elongated shapes. Now, the thickness, width, length, and geometry of nanoparticles can be varied over a wide range, 3,4 and tunable bulk and surface anisotropics yield additional complexity. This makes the magnetism of the particles more involved.…”

Section: Introductionmentioning

confidence: 99%

Multidomain and incoherent effects in magnetic nanodots

Skomski

Kashyap

Sorge

et al. 2004

Journal of Applied Physics

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The magnetic ground state and the magnetization reversal of aspherical nanoparticles are investigated by model calculations and micromagnetic simulations. Essential deviations from Kittel's domain theory occur for very flat and very elongated particles, for particles whose size is comparable to the domain-wall width, and when the particle shape is strongly nonellipsoidal. For example, the single-domain state of square rod is much less stable than that of comparable elongated ellipsoids, because most of the surface charge of long ellipsoids is located on the sides. Another specific feature of flat particles is suppression of the curling mode.

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Section: Introductionmentioning

confidence: 99%

Multidomain and incoherent effects in magnetic nanodots

Skomski

Kashyap

Sorge

et al. 2004

Journal of Applied Physics

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“…MFM images are frequency images acquired by a high-coercivity CoPt tip magnetized along the tip direction, that is, perpendicular to the film plane. in interference maxima by phase changes in carbon [5]. The MFM image shows that the dots are magnetic and embedded in a nonmagnetic matrix and multi-domain structures were observed within each dot.…”

Section: Expermentsmentioning

confidence: 93%

“…Our recent work has shown that it is viable to employ interferometric laser to generate magnetic nanodot arrays directly [5]. The dots are formed by locally annealing the sputtered amorphous Co-C films in regions where the laser intensity is highest.…”

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confidence: 99%

Ferromagnetic Co-C nanodot arrays produced by direct interferometric laser annealing

Zheng

Liu

et al. 2001

IEEE Trans. Magn.

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Polushkin, Nikolay; and Salashchenko, N.N., "Ferromagnetic Co-C nanodot arrays produced by direct interferometric laser annealing" (2001 Abstract-Magnetic properties of Co-C nanodot arrays produced by direct interferometric laser annealing are investigated by magnetic force microscopy (MFM) and magnetization measurements. The dots are formed by locally annealing sputtered amorphous Co-C films in regions where the laser intensity is highest. As-sputtered Co-C films do not exhibit ferromagnetic order at room temperature, but MFM shows that the dots become magnetic upon annealing, possibly due to the agglomeration or phase separation of Co-rich clusters. The dots are embedded in either a paramagnetic or weakly magnetic matrix. The magnetic properties of the generated pattern can be changed by varying the laser power. The present results show that direct interferometric lithography may become a useful tool for fabricating future patterned magnetic nanostructures.Index Terms-Artificially structured materials-small particles and patterned films, magnetic domains.

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“…Recently, various nano-patterning techniques, such as laser interference lithography [4][5][6], nano-sphere lithography [7][8][9], block copolymer lithography [10][11][12], nanoimprint lithography (NIL) [13][14][15][16][17][18][19][20], have been developed in order to fabricate nano-patterns with low process cost. Conventionally, to fabricate nano-patterns composed of inorganic functional materials via these indirect patterning techniques, four common steps are needed, including deposition of functional materials, formation of polymer resist patterns on the functional material layer, descum of a e-mail: heonlee@korea.ac.kr polymer resist patterns and dry or wet etching of functional materials.…”

Section: Introductionmentioning

confidence: 99%

Recent progress in direct patterning technologies based on nano-imprint lithography

Byeon

Lee

2012

Eur. Phys. J. Appl. Phys.

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Abstract. Nano-imprint lithography (NIL) is one of the most promising patterning technologies, in which nano-and micro-patterns are fabricated on various substrates. NIL provides high throughput and low cost in fabricating nano-structures due to its simple process and allows resolution below 10 nm without issues of light diffraction with conventional lithographic techniques. Its patterning mechanism is based on mechanical deformation of a polymer resist, which is simply done by pressing with a mold. This patterning mechanism also enables inorganic and organic-inorganic hybrid materials to be directly patterned by NIL. This article covers the recent progress of NIL-based direct patterning techniques and their applications to devices. Recently, functional nano-and micro-patterns have been applied to various electronic devices for the enhancement of overall performance. Fabrication methods of these devices are difficult using conventional lithographic techniques due to complex processes, high cost and low throughput. Direct NIL technique using functional resist can simply fabricate functional nano-and micro-structures and thus can be usefully applied to various industries.

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Magnetic nanodot arrays produced by direct laser interference lithography

Cited by 81 publications

References 17 publications

Multidomain and incoherent effects in magnetic nanodots

Multidomain and incoherent effects in magnetic nanodots

Ferromagnetic Co-C nanodot arrays produced by direct interferometric laser annealing

Recent progress in direct patterning technologies based on nano-imprint lithography

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