Luminescent thin films of Eu-bearing UiO-66 metal organic framework prepared by ALD/MLD

Silva, R.M.; Carlos, Luís D.; Rocha, João; Silva, R.F.

doi:10.1016/j.apsusc.2020.146603

Cited by 24 publications

(17 citation statements)

References 37 publications

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“…for thermoelectric devices, lithium-ion batteries and catalysis [16][17][18]. The technique has also been used to deposit Ln-based hybrid thin films, which have demonstrated interesting photoluminescence (down-shifting) and upconversion characteristics [19][20][21]. Compared to the inorganic luminescent thin films deposited using ALD, the ALD/MLD approach offers some additional benefits, such as material deposition on polymeric substrates for flexible devices [22] and appreciably high growth rates [8].…”

Section: Introductionmentioning

confidence: 99%

Effect of carbon backbone on luminescence properties of Eu-organic hybrid thin films prepared by ALD/MLD

et al. 2021

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Here we show that the backbone of the organic ligand has a profound impact on the luminescence characteristics of lanthanide-organic materials. We employ the emerging atomic/molecular layer deposition (ALD/MLD) technique to deposit europium-based thin films where the organic ligands vary in terms of the number of aromatic rings in their backbone (benzene, naphthalene and anthracene). Enlarging the backbone shifts the excitation towards visible wavelengths, but it simultaneously decreases the emission intensity. Moreover, for the Eu-terephthalate films with the single benzene ring as the organic backbone, we investigate the effects of diluting the Eu3+ concentration with Y3+ to reveal that the emission intensity is optimized around 12% Eu3+ concentration. Interestingly, such a dependence of luminescence intensity on the concentration of emitting species suggests that our (Eu,Y)-organic thin films behave more like ionic phosphors than discrete metal–ligand molecules. Graphical abstract

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Section: Introductionmentioning

confidence: 99%

Effect of carbon backbone on luminescence properties of Eu-organic hybrid thin films prepared by ALD/MLD

et al. 2021

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“…Several studies have focused on the photoluminescence properties of lanthanide-based ALD/MLD thin films. In particular, the characteristic red Eu 3+ luminescence has been realized for a number of Eu-organic films; [57,266,429] the mechanical flexibility expected for these films was demonstrated as well (Figure 30). [428] An interesting notion is that, while in purely inorganic matrices, such as (Y,Eu) 2 O 3 , the Eu 3+ activator concentration typically needs to be strongly diluted due to the well-known concentration quenching phenomenon, in the ALD-/MLD-grown Eu-organic films, the spacious organic linkers seem to take care of this issue, as intense luminescence emission has been achieved for these films even with 100% occupation of the Ln site with Eu.…”

Section: Other Applicationsmentioning

confidence: 86%

“…[208] Regarding the organic component, only aromatic organic precursors have been employed in combination with the rare earth elements, one of the motivations being the possibility to find UV and/or visible light absorbing organic molecules as sensitizers of the characteristic luminescence of the different R ion species. For example, Y(thd) 3 has been combined with 2,3-pyrazinedicarboxylic acid (2,3-PZD), [214] 2,6-NDC, [122] 1,4-NDC, BDC, 9,10-anthracenedicarboxylic acid (ADA), [266] and La(thd) 3 with BDC, [129] uracil and adenine, [58] and Eu(thd) 3 with BDC, [57,266] 3,5-PDC, [57,428] 2,6-PDC, [57] 1,4-NDC, [266] ADA, [266] and 2-amino-1,4-BDC, [429] and Er(thd) 3 or Er(DPDMG) with 2,3-PZD, [214] 3,5-PDC, [208] and 2 [259] Different pyridine-based organic precursors yield strong bonds via N and O donor atoms with the large R 3+ ions acting as hard acids such that the resultant hybrids usually are thermally stable and exhibit intense photoluminescence. Different nucleobases have been considered attractive building blocks for luminescent nanostructures for many advanced applications, such as sensors and organic light emitting diodes.…”

Section: Rare-earth-element-based Processesmentioning

confidence: 99%

“…[128,129] More recent studies demonstrated the possibilities provided by different functionalization schemes. In the two well-behaving ALD/MLD processes yielding in situ crystalline Li-2-amino-1,4-BDC [225] and Eu-2-amino-1,4-BDC [429] films, the BDC molecule was functionalized with an additional amino group attached to the benzene ring. The former Li-based material was found to possess a previously unknown crystal structure, whereas the Eu-based material was compatible with the UiO-66 structure.…”

Section: In Situ Crystalline Thin Filmsmentioning

confidence: 99%

“…[57] Moreover, by controlling the size of the organic backbone (e.g., BDC, 1,4-NDC, ADA, 3,5-PDC, 2,6-NDC, 2-amino-1,4-BDC) or including additional functional groups/bonding sites into the backbone both the absorption/excitation wavelength range and the emission intensity of these Eu-organic films have been successfully tailored. [57,266] Other highlights among the ALD/MLD Ln-organic family of luminescence thin films are the MOF-structured (UiO-66) Eu-2-amino-1,4-BDC [429] films and the erbium-based Er-3,5-PDC [208] films.…”

Section: Other Applicationsmentioning

confidence: 99%

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organic ligands act as bridges between the metal centers to form infinite 1D, 2D, or 3D structures. These materials are often referred to as coordination polymer (CP) [1] or metal-organic framework (MOF) [2] materials; the latter term is used when the metal-organic material is crystalline and highly porous. [3] The research field of CP-and MOF-type materials has grown tremendously over the last two decades. The structural and chemical diversity of these materials has served as a continuous source of scientific excitement; the same diversity has also triggered huge technological interest as these materials possess enormous potential to be tailored for a wide variety of applications ranging from gas capture, storage, and separation to sensing, catalysis, optics, electronics, and energy storage. [4][5][6][7] Most of the targeted application breakthroughs of metal-organics require that these materials can be produced as highquality thin films and coatings, which can be integrated with the other components in the actual device configuration. The possibility to deposit such thin films in an industry-feasible manner on the substrate types needed, would be a major step forward in the field. [8] Traditionally, solvent-based processes such as liquid-phase epitaxy, Langmuir-Blodgett, layer-by-layer, and electrochemical deposition techniques have been used for metal-organic thin films. [9][10][11] These are, however, incompatible with the requirements set by the possible integration of the materials in microelectronics. This is due to corrosion and contamination risks, and the problems in patterning and precise deposition on high-aspect-ratio features. Hence, it is vital to develop solventfree thin-film deposition routes for the metal-organic material family. In the optimal case, these deposition methods should allow conformal coatings on large-area and high-aspect-ratio substrates.The currently strongly emerging ALD/MLD technique is uniquely suited to address the challenge in a scientifically elegant yet industrially feasible way. This technique is derived from the two parent gas-phase thin-film techniques: ALD for inorganic materials (mostly binary metal oxides, sulfides, and nitrides), [12][13][14] and its counterpart MLD for purely organic thin films (e.g., polyimides and polyamides). [15] In both cases, the attractive film growth characteristics are derived from the unique way of separating the different precursor gas pulses. Currently, ALD is the standard thin-film technology in many Atomic layer deposition (ALD) for high-quality conformal inorganic thin films is one of the cornerstones of modern microelectronics, while molecular layer deposition (MLD) is its less-exploited counterpart for purely organic thin films. Currently, the hybrid of these two techniques, i.e., ALD/MLD, is strongly emerging as a state-of-the-art gas-phase route for designer's metal-organic thin films, e.g., for the next-generation energy technologies. The ALD/MLD literature comprises nearly 300 original journal papers covering most of the alkali...

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High‐quality rare earth element (R) based thin films are in demand for applications ranging from (opto)electronics and energy conversion/storage to medical diagnostics, imaging and security technologies. Atomic layer deposition (ALD) offers large‐area homogeneous and conformal ultrathin films and is uniquely suited to address the requirements set by the potential applications of R‐based thin films. The history starts from the 1990s, when the first electroluminescent R‐doped thin films were grown with ALD. The interest soon expanded to rare earth element oxide layers as high‐k gate dielectrics in semiconductor devices, and later to complex ternary and quaternary perovskite oxides with novel functional properties. The most recent advancements related to the combined atomic/molecular layer deposition (ALD/MLD) have rapidly expanded the family of R‐organic hybrid materials with intriguing luminescence and up‐conversion properties. This review provides up‐to‐date insights to the current state of ALD and ALD/MLD research of R‐based thin films and highlights their application potential.

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Luminescent thin films of Eu-bearing UiO-66 metal organic framework prepared by ALD/MLD

Cited by 24 publications

References 37 publications

Effect of carbon backbone on luminescence properties of Eu-organic hybrid thin films prepared by ALD/MLD

Effect of carbon backbone on luminescence properties of Eu-organic hybrid thin films prepared by ALD/MLD

Atomic/Molecular Layer Deposition for Designer's Functional Metal–Organic Materials

Atomic and Molecular Layer Deposition of Functional Thin Films Based on Rare Earth Elements

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