2018
DOI: 10.1088/2053-1591/aad7a6
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Luminescence of silicon nitride films implanted with nitrogen ions

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Cited by 7 publications
(4 citation statements)
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“…A chemical synthesis that produces a colloidal dispersion with reasonable size control is one of the most widely used techniques [100,218,219] , b) [220][221][222] , c) [222][223][224] , d) [225,226] , e) [227] , f ) [228] , g) [229] , h) [230] , i) [231] , j) [232] , k) [233] , l) [234] , m) [235] , n) [236] .…”
Section: Embedding Qds and Nps In Thin-film Matrices And Their Relati...mentioning
confidence: 99%
See 1 more Smart Citation
“…A chemical synthesis that produces a colloidal dispersion with reasonable size control is one of the most widely used techniques [100,218,219] , b) [220][221][222] , c) [222][223][224] , d) [225,226] , e) [227] , f ) [228] , g) [229] , h) [230] , i) [231] , j) [232] , k) [233] , l) [234] , m) [235] , n) [236] .…”
Section: Embedding Qds and Nps In Thin-film Matrices And Their Relati...mentioning
confidence: 99%
“…Schematic summary of the main configurations of Si-based nanomaterials based on deposition techniques and their applications. References are numbered as indicated: a)[100,218,219] , b)[220][221][222] , c)[222][223][224] , d)[225,226] , e)[227] , f )[228] , g)[229] , h)[230] , i)[231] , j)[232] , k)[233] , l)[234] , m)[235] , n)[236] .…”
mentioning
confidence: 99%
“…The films are subsequently implanted with N and subjected to rapid thermal annealing (RTA) at 1200 °C for 3 min, resulting in increased luminescence in the bluegreen region. 33,44,58 • Pentachlorodisilane (PCDS, HCl 2 SiSiCl 3 ), which in one instance is reacted with (NH 3 + H 2 ) at 800 °C-1400 °C to grow practically H-free and stoichiometric SiN 1.33 . Films were amorphous up to 1000 °C and crystalline α-Si 3 N 4 at 1200 °C and above.…”
Section: Solar Cells and Optical Waveguidesmentioning
confidence: 99%
“…Moreover, by varying the growth conditions, stronger light emission in a wide spectral range from UV to IR can result in SiN films [9,10]. Additionally, even though the physical mechanism that gives rise to the emission of light in SiN films has not been clarified yet, control over the Si nitride films by a doping process using nitrogen atoms by ion-implantation (which is a fully CMOS compatible technique) has been reported [11]. On the other hand, Si-rich silicon nitride has also been reported to present enhanced Kerr nonlinearity with respect to the standard stoichiometric Si 3 N 4 materials [6,8,[12][13][14].…”
Section: Introductionmentioning
confidence: 99%