“…In general, such physical, optical and electric properties of HfO 2 films are highly dependent on film surfaces, interface structures, morphologies and chemical stoichiometry. These aspects can usually be controlled by the preparation techniques, growth conditions and post treatments [3,[6][7][8][9][10]. So that with suitable coating materials, dielectric films having properties such as: high transparency, suitable refractive index, good adhesion, low stress, reasonable hardness, good chemical stability and environmental behavior, can be produced.…”