2014
DOI: 10.1016/j.jlumin.2013.09.029
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Luminescence behavior and compensation effect of N-doped ZnO films deposited by rf magnetron sputtering under various gas-flow ratios of O2/N2

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Cited by 10 publications
(2 citation statements)
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“…The amount of V O firstly increases with Li content, however, decreases after the Li content increasing to x = 0.1. This is due to the self-compensation effect of the two doping forms of Li in ZnO [37], which have been shown in Eqs. (1) and (2).…”
Section: Materials Characterizationmentioning
confidence: 84%
“…The amount of V O firstly increases with Li content, however, decreases after the Li content increasing to x = 0.1. This is due to the self-compensation effect of the two doping forms of Li in ZnO [37], which have been shown in Eqs. (1) and (2).…”
Section: Materials Characterizationmentioning
confidence: 84%
“…obtained a p-type ZnO layer in 1997 by nitrogen doping [15]. After this development, N, P, As and Li doping and co-doping of N with group-III elements have also resulted in p-type ZnO and MgZnO films [16][17][18][19][20]. However, it is ambiguous that p-type doping mechanisms and the stability as well as reproducibility of the p-type conduction in MgZnO films are the main issues at present in this research field.…”
Section: Introductionmentioning
confidence: 99%