&lt;title&gt;New 5X i-Line Projection Aligner For VLSI Fabrication&lt;/title&gt;

Sugiyama, Shuji; Tawa, Tsutomu; Oshida, Yoshitada; Kurosaki, Toshiei; Mizuno, Fumio

doi:10.1117/12.968429

Cited by 6 publications

(1 citation statement)

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“…A simple threshold algorithm is utilized to calculate the misalignment. Hitachi LD-5010i (5x i-line) steppers also adopt the bright field scheme [9] to be one of the alignment schemes available on the steppers. The same wavelengths -e-line and d-line are used for alignment except that here the images generated by these two wavelengths are summed to be the alignment image.…”

Section: Bright Fieldmentioning

confidence: 99%

Modeling of optical alignment and metrology schemes used in integrated circuit manufacturing

Yuan

Strojwas

1990

Optical/Laser Microlithography III

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The aim ofour work was to develop rigorous models to study various optical alignment and metrology schemes implemented in commercial tools. These schemes indude wafer alignment schemes in steppers and linewidth measurement schemes in optical microscopes. A simulator called METRO based on the models developed has been implemented to facilitate this task. Theoretical and experimental verification efforts have been performed to examine the validity of the simulation results, and good agreement has been obtained. By utilizing METRO, process engineers can gain more insight into the equipment under operation so as to obtain more accurate alignment and measurement results. Also, the equation formulation in METRO is general enough so that optics designers can easily adopt or modify the code to help in devising innovative alignment and metrology schemes.

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Section: Bright Fieldmentioning

confidence: 99%