Techniques and Tools for Optical Lithography

Waldo, Whit

doi:10.1016/b978-081551444-2.50007-0

Cited by 2 publications

(2 citation statements)

References 221 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…This determined that optical fibers have historically been used in telecommunication and sensing systems to transmit signals in the infrared domain [126][127][128][129]. However, the recent technological advances in fields like UV photolithography [130,131], laser surgery [132][133][134], and fiberbased photovoltaics [135][136][137][138][139][140][141] have given a new impulse towards the development of waveguides able to withstand the damaging effects of high-energy photons and maintain a high transmittance of UV and optical signals.…”

Section: Photodarkening In Optical Fibersmentioning

confidence: 99%

Intrinsic Point Defects in Silica for Fiber Optics Applications

2021

View full text Add to dashboard Cite

Due to its unique properties, amorphous silicon dioxide (a-SiO2) or silica is a key material in many technological fields, such as high-power laser systems, telecommunications, and fiber optics. In recent years, major efforts have been made in the development of highly transparent glasses, able to resist ionizing and non-ionizing radiation. However the widespread application of many silica-based technologies, particularly silica optical fibers, is still limited by the radiation-induced formation of point defects, which decrease their durability and transmission efficiency. Although this aspect has been widely investigated, the optical properties of certain defects and the correlation between their formation dynamics and the structure of the pristine glass remains an open issue. For this reason, it is of paramount importance to gain a deeper understanding of the structure–reactivity relationship in a-SiO2 for the prediction of the optical properties of a glass based on its manufacturing parameters, and the realization of more efficient devices. To this end, we here report on the state of the most important intrinsic point defects in pure silica, with a particular emphasis on their main spectroscopic features, their atomic structure, and the effects of their presence on the transmission properties of optical fibers.

show abstract

Section: Photodarkening In Optical Fibersmentioning

confidence: 99%

Intrinsic Point Defects in Silica for Fiber Optics Applications

2021

View full text Add to dashboard Cite

show abstract

“…Although considerable effort has been dedicated to define technologies and procedures to meet the requirements on the product quality,3, 4 automatic process control has not yet been implemented on a large scale in semiconductor manufacturing, and the industrial practice is often carried out empirically with relatively little understanding of the underlying physics and chemistry 5. Statistical process control techniques, too, are sometimes adopted5–7 in order to monitor the variability of the process, to detect the abnormal conditions, and to identify the cause for a perceived anomaly.…”

Section: Introductionmentioning

confidence: 99%

Monitoring roughness and edge shape on semiconductors through multiresolution and multivariate image analysis

et al. 2009

View full text Add to dashboard Cite

Photolithography is one of the most important processes in the production of integrated circuits. Usually, attentive inspections are required after this process, but are limited to the measurement of some physical parameters such as the critical dimension and the line edge roughness. In this paper, a novel multiresolution multivariate technique is presented to identify the abnormalities on the surface of a photolithographed device and the location of defects in a sensitive fashion by comparing it to a reference optimum, and generating fast, meaningful and reliable information. After analyzing the semiconductor surface image in different levels of resolutions via wavelet decomposition, the application of multivariate statistical monitoring tools allows the in-depth examination of the imprinted features of the product. A two level nested PCA model is used for surface roughness monitoring, while a new strategy based on ‘‘spatial moving window’’ PCA is proposed to analyze the shape of the patterned surface. The effectiveness of the proposed approach is tested in the case of semiconductor surface SEM images after the photolithography process. The approach is general and can be applied also to inspect a product through different types of images, different phases of the same production systems, or different processes

show abstract

Techniques and Tools for Optical Lithography

Cited by 2 publications

References 221 publications

Intrinsic Point Defects in Silica for Fiber Optics Applications

Intrinsic Point Defects in Silica for Fiber Optics Applications

Monitoring roughness and edge shape on semiconductors through multiresolution and multivariate image analysis

Contact Info

Product

Resources

About