&lt;title&gt;Laboratory methods for investigations of multilayer mirrors in extreme ultraviolet and soft x-ray region&lt;/title&gt;

Bibishkin, M. S.; Chekhonadskih, D. P.; Чхало, Н. И.; Kluyenkov, E. B.; Pestov, A. E.; Салащенко, Н. Н.; Shmaenok, L. A.; Zabrodin, I. G.; Zuev, S. Yu.

doi:10.1117/12.556949

Cited by 43 publications

(3 citation statements)

References 2 publications

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“…24 25 The radiation source for the monochromator RSM-500 is a demountable X-ray tube with replaceable anodes. 26 The LHT-30 monochromator is equipped with a gas discharge radiation source. 24 Synchrotron measurements in the EUV range were performed on a UHV triaxial reflectometer on the optical line of the storage ring BESSY-II.…”

Section: Methodsmentioning

confidence: 99%

Beryllium-Based Multilayer Mirrors and Filters for the Extreme Ultraviolet Range

Nikolay

Alexey

Andrey

et al. 2019

j nanosci nanotechnol

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This paper presents the first results of systematic studies of beryllium as a material for multilayer mirrors (MLM) and transmission filters (TF) for the EUV spectral range. The objective for the study is the need for the increase in reflectivity and spectral resolution of MLMs for studying the Sun's corona. We investigated Mo/Be (working wavelength is 13.2 nm), Be/Al and Be/Si/Al (17.1 and 30.4 nm) multilayers, as well as free-standing Be films. It was shown that the Be-containing MLMs have significant advantage in reflectivity while their spectral pass-band is similar to beryllium-free MLMs. Observation of the MLMs in the course of 20 months has not revealed any significant decrease in the reflection coefficient. Effect of the silicon interlayers on reflectance of Be/Al MLM is explained. Investigation of a free-standing beryllium filter of the 160 nm thickness showed that its mechanical strength is approximately at the same level as that of the aluminum filter with the same thickness. There is also high stability of the transmittance.

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Section: Methodsmentioning

confidence: 99%

Beryllium-Based Multilayer Mirrors and Filters for the Extreme Ultraviolet Range

Nikolay

Alexey

Andrey

et al. 2019

j nanosci nanotechnol

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show abstract

“…Precise measurements of transparency at 13.5 nm are performed with a double mirror reflectometer operating in a transmission mode. 18 We also use a grazing incidence grating monochromator with an X-ray tube to characterize filter samples in EUV and soft X-ray range. The tube is designed to work with replaceable anodes so that a number of wavelength intervals near emission lines of anode materials are available.…”

Section: Fabrication and Characterization Ofmentioning

confidence: 99%

Free-standing spectral purity filters for extreme ultraviolet lithography

Чхало

Дроздов

Kluenkov

et al. 2012

J. Micro/Nanolith. MEMS MOEMS

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Free-standing multilayer films consisting of Si, Zr, Mo and silicides of both metals have been fabricated and studied as spectral purity filters (SPF) for extreme ultraviolet (EUV) (13.5 nm) lithography tools. Comparative tests of multilayer SPF structures of various compositions have been performed at high power loads. It was found that a Mo∕ZrSi 2 structure with MoSi 2 capping layers is featured with capability to withstand prolonged heating in vacuum (10 −7 mbar) at 900-950°C. A technique of fabrication of large aperture free-standing multilayers was developed, and a pilot sample of the above film structure of 160 mm in diameter, 50 nm thick, with transparency at 13.5 nm above 70% was fabricated as a conceptual prototype of SPFs with large dimensions.

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“…Therefore in IPM RAS laboratory reflectometers on the basis of high resolution grating monochromators have been developed. These monochromators have a movable entrance slit and diffraction grating (Chkhalo et al, 1998;Zuev & Mitrofanov, 2002;Bibishkin et al, 2004;Bibishkin et al, 2005). In the reflectometrs the monochromators of type RSM-500 (Lukirsky et al, 1967) and McPherson-247 (Website Mcpherson Company, 2009) are used.…”

Section: Reflecting Multilayer Interference Mirrorsmentioning

confidence: 99%

Manufacturing and Investigating Objective Lens for Ultrahigh Resolution Lithography Facilities

Чхало¹,

Pestov²,

N.³

et al. 2010

Lithography

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<title>Laboratory methods for investigations of multilayer mirrors in extreme ultraviolet and soft x-ray region</title>

Cited by 43 publications

References 2 publications

Beryllium-Based Multilayer Mirrors and Filters for the Extreme Ultraviolet Range

Beryllium-Based Multilayer Mirrors and Filters for the Extreme Ultraviolet Range

Free-standing spectral purity filters for extreme ultraviolet lithography

Manufacturing and Investigating Objective Lens for Ultrahigh Resolution Lithography Facilities

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