Manufacturing and Investigating Objective Lens for Ultrahigh Resolution Lithography Facilities

Diffraction-limited short-wavelength optics: Analysis, fabrication, and application

“…It was reported [30] that wave front aberrations can be measured to within 0.08 nm at a NA of about 0.1. Unfortunately, except for [25, 26,30], the authors of other studies either do not consider the measurement accuracies ensured by instruments or give only data without a description of the accuracy measurement method, which cast deep doubts on their reliability. Interferometers based on a diffracted reference wave have not found ubiquitous applications in prac tice because their adjustment is a complicated process and the quality of the diffracted wave front is uncon trollably dependent on aberrations of primary optics [31].…”

“…When traditional roughness measurement tech niques (atomic force and optical interference micros copy and hard X ray diffusion scattering analysis) are employed to investigate supersmooth surfaces in the mid and high frequency ranges, their real possibili ties must be seriously revised [26,27].…”

“…It can be noted that, at present, local ion beam correction of materials (such as Zerodur [38], quartz, and a Cr/Sc multilayer structure (MS) [26]) has been certified as a reliable method for the precise shape cor rection of optical surfaces or substrates in components of X ray image forming optics.…”

Extended model for the reconstruction of periodic multilayers from extreme ultraviolet and X-ray reflectivity data

“…Thus, the form of the transition layer ceases to be fixed; at the same time, it contains fewer degrees of freedom than in model-free approaches. The features of such an extended model will be considered in a general manner and illustrated with examples of real mirrors optimized for beyond EUV lithography at wavelengths of 11.3 nm (Chkhalo & Salashchenko, 2013;Montcalm et al, 1998).…”

Ошибки Измерений Интерферометров С Дифракционной Волной Сравнения

“…В частности, ИДВС на основе одномодового оптического волокна [6] из-за большого диаметра кора d Нанофизика и наноэлектроника" (угловая апертура дифрагированной волны определяется отношением λ/d) обладают низкой рабочей апертурой и сильной неоднородностью интенсивности генерируемой волны. Помимо ограниченной апертуры сильная неоднородность интенсивности волны приводит к сдвигу координат экстремумов интерференционной картины и соответственно потере точности измерений [9].…”