Abstract:As process complexity and number of plasma processing steps increase, process-induced charging damage becomes an emerging issue in continuously scaling device manufacturing. It is important, therefore, to be able to pinpoint most of potential sources of plasma charging-induced damage. The most commonly used approach involves processing and testing of several modules of antenna-type transistors, with charge sensitive antennas defmed and exposed to plasma at various stages of processing. Subsequent analysis of d… Show more
“…Antenna structures have been successfully applied for detection of charging damage from a variety of sources such as plasma etching, ion implantation and plasma enhanced deposition [1].…”
“…Antenna structures have been successfully applied for detection of charging damage from a variety of sources such as plasma etching, ion implantation and plasma enhanced deposition [1].…”
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.