&lt;title&gt;A scoring methodology for quantitatively evaluating the quality of double patterning technology-compliant layouts&lt;/title&gt;

Wang, Lynn T. N.; Madhavan, Sriram; Malik, Shobhit; Pathak, Piyush; Capodieci, Luigi

doi:10.1117/12.916494

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2014

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“…Then, based on the evaluation, decomposition-aware layout optimization can be achieved using the guidance from the analysis. This paper presents the layout design improvements for 8, 9, 11, and 13-track 20/14nm standard cells using a decomposition-aware scoring methodology proposed by Wang et al [3]. The methodology first evaluates a DPTcompliant layout based on a set of DPT-specific metrics that have been defined from characterizing the sensitivity of layout parameters to manufacturability.…”

Section: Introductionmentioning

confidence: 99%

Decomposition-aware layout optimization for 20/14nm standard cells

et al. 2014

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Decomposition-aware layout design improvements for 8, 9, 11, and 13-track 20/14nm standard cells are presented. Using a decomposition-aware scoring methodology that quantifies the manufacturability of layouts, the Double Patterning Technology (DPT)-compliant layouts are optimized for DPT-specific metrics that include: the density difference between the two decomposition mask layers, the enclosure of stitching areas, the density of stitches, and the design regularity of stitching areas. For a 9-track standard cell, eliminating the stitches from the layout design improved the composite score from 0.53 to 0.70.

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Section: Introductionmentioning

confidence: 99%