Low voltage electron beam lithography in self-assembled ultrathin films with the scanning tunneling microscope

Abstract

With a scanning tunneling microscope (STM) operating in vacuum, we have studied the lithographic patterning of self-assembling organosilane monolayer resist films. Where the organic group is benzyl chloride, the resist layer can be patterned with electrons down to 4 eV in energy. The patterned films have been used as templates for the electroless plating of thin Ni films. Linewidths down to ∼20 nm have been observed in scanning electron micrographs of the plated films. Still smaller features are observed in STM images of the exposed organosilane films.

Engineering Silicon Oxide Surfaces Using Self‐Assembled Monolayers

“…[231][232][233] Patterns smaller than 10 nm could also be attained by using scanning electron microscopy (SEM) with a small beam diameter. [234] A different development of the created patterns was reported by Marrian et al [235] Low voltage electron beam lithography was used to pattern films and the patterns were applied as templates for the electroless Scheme 3. UV photolithography to fabricate hydrophilic patterns inside microchannels.…”

Gestaltung der Siliciumoxidoberfläche durch selbstorganisierte Monoschichten

“…Dabei ergaben sich Linienbreiten von weniger als 20 nm. [235] Es gibt einige Berichte zur Kombination von Elektronenstrahllithographie mit funktionalisierten SAMs. So erzeugten Craighead et al Muster in aminoterminierten SAMs und entwickelten sie anschließend, indem sie sie Palladiumkolloiden und ummantelten fluoreszenten Polystyrolpartikeln aussetzten.…”

Nanofabrication with proximal probes

“…Unfortunately, films sufficiently thin to be compatible with the current feedback mechanism of an STM are generally too thin to make useful etch masks or defect-free lift-off layers. SAM's have not only demonstrated high resolution [49], but also compatibility with PPL [50] and functionality as a hard etch mask [8]. Because the mechanism that drives self-assembly is a highly energetic chemisorption reaction [51], films based on these materials have an extremely low defect density, are quite environmentally stable, and are mechanically robust.…”