2002
DOI: 10.1049/el:20020932
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Low-threshold current GaAsSb∕GaAs quantum well lasers grown by solid source molecular beam epitaxy

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Cited by 16 publications
(4 citation statements)
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“…The knowledge of GaAsSb band parameters, especially the type of GaAsSb/GaAs band alignment, provides an excellent opportunity to improve the performance of both heterojunction bipolar transistors 10 and optoelectronic devices. 11,12 Several earlier studies have reported contradictory results on the GaAsSb/GaAs conduction band offset. Depending on conduction band alignment at GaAsSb/ GaAs interface, the structural system based on these materials can be either type-I ͑with electrons localized in GaAsSb layer͒ or type-II ͑with electrons localized not in the QW region but in the GaAs barrier͒.…”
Section: Introductionmentioning
confidence: 99%
“…The knowledge of GaAsSb band parameters, especially the type of GaAsSb/GaAs band alignment, provides an excellent opportunity to improve the performance of both heterojunction bipolar transistors 10 and optoelectronic devices. 11,12 Several earlier studies have reported contradictory results on the GaAsSb/GaAs conduction band offset. Depending on conduction band alignment at GaAsSb/ GaAs interface, the structural system based on these materials can be either type-I ͑with electrons localized in GaAsSb layer͒ or type-II ͑with electrons localized not in the QW region but in the GaAs barrier͒.…”
Section: Introductionmentioning
confidence: 99%
“…The GaAsSb/GaAs heterostructure system has attracted much attention recently because of its potential application in the semiconductor industry. In particular its type-II band alignment provides an excellent opportunity to improve the performance of both heterojunction bipolar transistors (HBTs) [1] and optoelectronic devices [2][3][4]. The defining feature of a type-II quantum well is the spatial separation of electron and hole confinements in the epitaxial growth direction.…”
Section: Introductionmentioning
confidence: 99%
“…The most important advantage of 1.3 mm GaAs-based lasers is the capability to fabricate 1.3 mm vertical cavity surface emitting lasers (VCSELs) with the integration of the well-developed GaAs=AlAs distributed Bragg reflectors (DBRs) and AlAs oxidation techniques. One of the active media used for GaAs-based 1.3 mm lasers is the strained GaAs=GaAsSb quantum well (QW) [1][2][3] which exhibits a staggered type-II band alignment and possesses a potential of emitting photons with wavelength longer than that corresponding to the fundamental bandgap energy of each constituent. The strained GaAs=GaAsSb QW is a promising material for optical communication applications.…”
mentioning
confidence: 99%
“…We have successfully used molecular beam epitaxy (MBE) to grow a GaAs=GaAsSb double quantum well laser and obtained 1280 nm emission with a low threshold current density of 210 A=cm 2 at room temperature [3]. To extend the lasing wavelength to 1.3 mm, we increased the Sb content in the GaAsSb quantum well and reduced the number of quantum wells to one.…”
mentioning
confidence: 99%