2018
DOI: 10.1002/slct.201800911
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Low‐Temperature Synthesis of Graphene by ICP‐Assisted Amorphous Carbon Sputtering

Abstract: Efficient and affordable synthesis of graphene at low temperatures remains a significant challenge that potentially limits the use of this material in real-life applications. We describe here a simple, efficient, highly controllable technique to synthesize graphene by sputtering carbon from a solid source with the assistance of inductively coupled plasma (ICP), followed by controllable low-temperature annealing at about 550 o C. Raman scattering and X-ray diffraction characterizations have revealed the formati… Show more

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Cited by 7 publications
(4 citation statements)
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“…Many papers reported Raman spectra after background removal to show the D-and G-bands clearly (as shown in Fig. 3) [88][89][90][91][92][93]. However, it should be noted that the uorescence background in a Raman spectrum gives very important structural information.…”
Section: Resultsmentioning
confidence: 99%
“…Many papers reported Raman spectra after background removal to show the D-and G-bands clearly (as shown in Fig. 3) [88][89][90][91][92][93]. However, it should be noted that the uorescence background in a Raman spectrum gives very important structural information.…”
Section: Resultsmentioning
confidence: 99%
“…Coatings (metals [67], metal oxides [68,69], metal carbides [35], ceramics [70]), selfhealing materials [38] and various types of surface modification [71,72] are examples of technologies that could be adapted for the mitigation of corrosion on satellites. However, coatings could be damaged by micrometeorites, space debris and handling.…”
Section: Use Of Nanomaterials For Corrosion Mitigation In Spacementioning
confidence: 99%
“…Among the many methods used for VOG preparation, chemical vapor deposition (CVD) has demonstrated great potential for economical mass production, however, it requires elevated temperatures (800-1000 • C) and the costs for industrial manufacturing are high [24][25][26]. VOG growth can be achieved at lower temperatures (<800 • C) if the inductively coupled plasma chemical vapor deposition method (ICP CVD) is used, and it has become a key technique for the synthesis of high-quality coating without material damage and undesired defect formation [27][28][29]. Another advantage of CVD is due to the broad choice of available substrates for VOG preparation (e.g., SiO 2 and Al 2 O 3 [30], Si [31], Ni [32], stainless steel [33][34][35][36], Cu [37][38][39][40], Co [41], Al and TiO 2 [42], Al 2 O 3 [43], and Pt [44][45][46]).…”
Section: Introductionmentioning
confidence: 99%