Properties of Nitrogen/Silicon Doped Vertically Oriented Graphene Produced by ICP CVD Roll-to-Roll Technology

Abstract

Simultaneous mass production of high quality vertically oriented graphene nanostructures and doping them by using an inductively coupled plasma chemical vapor deposition (ICP CVD) is a technological problem because little is understood about their growth mechanism over enlarged surfaces. We introduce a new method that combines the ICP CVD with roll-to-roll technology to enable the in-situ preparation of vertically oriented graphene by using propane as a precursor gas and nitrogen or silicon as dopants. This new technology enables preparation of vertically oriented graphene with distinct morphology and composition on a moving copper foil substrate at a lower cost. The technological parameters such as deposition time (1–30 min), gas partial pressure, composition of the gas mixture (propane, argon, nitrogen or silane), heating treatment (1–60 min) and temperature (350–500 °C) were varied to reveal the nanostructure growth, the evolution of its morphology and heteroatom’s intercalation by nitrogen or silicon. Unique nanostructures were examined by FE-SEM microscopy, Raman spectroscopy and energy dispersive X-Ray scattering techniques. The undoped and nitrogen- or silicon-doped nanostructures can be prepared with the full area coverage of the copper substrate on industrially manufactured surface defects. Longer deposition time (30 min, 450 °C) causes carbon amorphization and an increased fraction of sp3-hybridized carbon, leading to enlargement of vertically oriented carbonaceous nanostructures and growth of pillars.

Fenton-Hydroxyl Radical Antioxidant Efficiency of Ibuprofen-Fe3O4-GO Nanospheres

“…The crystalline structure of ibuprofen-Fe 3 O 4 -GO nanospheres was examined by X-ray powder diffraction in comparison with patterns of pristine ibuprofen (Table S5), GO and Fe 3 O 4 -GO nanoplatform (Figure c and Table ). The XRD pattern of GO in a solvent-free state shows two distinct reflexes at 2θ = 11.73° and 24.53° with the interplanar spacing values ∼8.759 and ∼4.215 Å, which can be assigned to (001) and (003) of GO . The interplanar spacing of the (001) plane is 0.779 Å higher than in graphite intercalation compound (∼7.980 Å) during the process of GO formation, which is indicative of the intercalation of oxygen atoms in the forming oxidized domains.…”

“…The XRD pattern of GO in a solvent-free state shows two distinct reflexes at 2θ = 11.73°and 24.53°with the interplanar spacing values ∼8.759 and ∼4.215 Å, which can be assigned to (001) and (003) of GO. 64 The interplanar spacing of the (001) plane is 0.779 Å higher than in graphite intercalation compound (∼7.980 Å) during the process of GO formation, which is indicative of the intercalation of oxygen atoms in the forming oxidized domains. On the other hand, the d ∼8.759 Å of (001) is comparable to the lattice expansion of (001) in GO caused by intercalation of 1-propanol (∼8.650 Å).…”

Chemical Vapour Deposition of Graphene—Synthesis, Characterisation, and Applications: A Review

“…Rozel et al succeeded in combining ICP-RF-PECVD with roll-to-roll technology to prepare nitrogen/silicon doped vertically oriented graphene (VOG) by using propane (C 3 H 8 ) as a precursor gas and nitrogen or silane as dopants. They also found that longer deposition time caused carbon amorphisation and increased sp3-hybridized carbon fraction, resulting in expansion of vertically oriented carbonaceous and pillars growth [ 109 ].…”

Development of Microstructured Carbon Coatings by Substrate-Catalytic CVD

“…Nanostructured carbon coatings for steel electrodes, due to their remarkable characteristics, such as high electrical conductivity, hydrophobicity, and chemical inertness, have found a place in many applications as proton-exchange membrane fuel cells [1], porous current collectors for lithium-ion batteries [2], and as an effective support to grow carbon nanotubes [3][4][5], vertically-oriented graphene [6], carbon fibers [5] and micro-sized carbon spheres [5]. However, the coating properties can vary widely due to the substrate composition and synthesis conditions, for example, different qualities of the carbon layer can both support or worsen the substrate corrosion resistance.…”