2020
DOI: 10.1002/chem.202000448
|View full text |Cite
|
Sign up to set email alerts
|

Low‐Temperature Solution Crystallization of Nanostructured Oxides and Thin Films

Abstract: As an introduction to this themed issue, a critically selected overview of recent progress on the topic of solution methods for the low‐temperature crystallization of nanoscale oxide materials is presented. It is focused on the low‐temperature solution processing of oxide nanostructures and thin films. Benefits derived from these methods span from minimizing the environmental impact to reducing the fabrication costs. In addition, this topic is regarded as a key objective in the area because it offers a unique … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

0
7
0

Year Published

2020
2020
2024
2024

Publication Types

Select...
9

Relationship

3
6

Authors

Journals

citations
Cited by 17 publications
(7 citation statements)
references
References 186 publications
0
7
0
Order By: Relevance
“…The high precision thickness control, excellent conformality, and possibility of being automated in a simple inexpensive way have enabled its differentiation from similar thin film deposition techniques performed in the liquid phase. 68 Moreover, in contrast to gas-phase ALD in which precursors must meet requirements such as having an appropriate vapor pressure and good thermal stability, 69 LALD can be performed with a broader diversity of well-known cheap reagents already used in solution chemistry. Herein, we have called attention to the current strengths of LALD for the fabrication of thin-film materials while, at the same time, hinted towards improvements that can allow it to become a mature technology.…”
Section: Discussionmentioning
confidence: 99%
“…The high precision thickness control, excellent conformality, and possibility of being automated in a simple inexpensive way have enabled its differentiation from similar thin film deposition techniques performed in the liquid phase. 68 Moreover, in contrast to gas-phase ALD in which precursors must meet requirements such as having an appropriate vapor pressure and good thermal stability, 69 LALD can be performed with a broader diversity of well-known cheap reagents already used in solution chemistry. Herein, we have called attention to the current strengths of LALD for the fabrication of thin-film materials while, at the same time, hinted towards improvements that can allow it to become a mature technology.…”
Section: Discussionmentioning
confidence: 99%
“…A relatively modified sol-gel method was used to synthesize the modified MT due to its superiority over the synthesis of powdered materials, which have high purity, homogeneity and stoichiometry at low temperature. [16,17] First, a mixture (1:2) of titanium(IV) isopropoxide precursor (97 %, Sigma-Aldrich) and isopropanol was added dropwise to the EDTA-Na2 solution prepared by mixing different amounts of EDTA-Na2 (99 %, Sigma-Aldrich) with 100 mL of deionized water and 1.40 mL of acetic acid under vigorous stirring at 4 o C for 3 h in order to make the sol form with varied EDTA-Na2:TiO2 molar ratios (0.5:1.0, 1.0:1.0 and 1.5:1.0). The asprepared solution was aged in the dark for 24 h to induce gelation.…”
Section: Materials Synthesis and Analysis Methodsmentioning
confidence: 99%
“…The samples were prepared via hydrothermal synthesis, since this route is wellestablished [23,24] and widely used for its flexibility in tuning different parameters such as concentration, additives, temperature, and reaction time. Furthermore, this synthesis aimed to optimize synthetic parameters in terms of yield and cost-effectiveness, and to develop a final scale-up process for possible future applications in industrial processes.…”
Section: Synthesis and Characterization Of Vo 2 (B) And Its Conversion To Vo 2 (M1)mentioning
confidence: 99%