Low-temperature resistance and its temperature dependence in nanostructured silver

Qin, Xiaoying; Zhang, W.; Zhang, L. D.; Jiang, Liudi; Liu, X. J.; Jin, Duo

doi:10.1103/physrevb.56.10596

Cited by 47 publications

(29 citation statements)

References 15 publications

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“…(1), shown in Table 1. The bulk mean free length of Ag is about 51 nm [14], which is much longer than the recrystallization grain size of the sintered Ag nanoparticles [ Fig. 3(c)].…”

Section: Resultsmentioning

confidence: 99%

Fabrication of interconnects using pressureless low temperature sintered Ag nanoparticles

Wang

et al. 2012

Materials Letters

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“…(1), shown in Table 1. The bulk mean free length of Ag is about 51 nm [14], which is much longer than the recrystallization grain size of the sintered Ag nanoparticles [ Fig. 3(c)].…”

Section: Resultsmentioning

confidence: 99%

Fabrication of interconnects using pressureless low temperature sintered Ag nanoparticles

Wang

et al. 2012

Materials Letters

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“…Since the wire dimensions are much larger than the mean free path of Ni then this enhancement in resistance value is owing to the effect of grainboundary scattering which is appeared to be predominant. It is needed to say that in nanocrystalline materials the resistivity temperature behavior ρ(T) is controlled by both phonon scattering, and interfacial scattering, and interfacial scattering enhances with decreasing temperature [5,6]. If the interfacial scattering becomes dominant, then the total resistance will possibly increases with decreasing temperature, showing nonmetallic behavior.…”

Section: Experimetal Detailsmentioning

confidence: 99%

Thermal and electrical transport properties of a single nickel nanowire

Harutyunyan

Lai

et al. 2007

Physica Status Solidi (b)

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The thermal conductivity (κ), specific heat (C p ) and the resistivity (ρ) of a single nickel nanowire have been measured in the temperature range from 4 to 300 K by means of the "self heating 3ω" technique. Starting with a 100 nm nickel film grown on a Si/Si 3 N 4 substrate by thermal evaporation, a suspended nickel nanowire was then fabricated through e-beam lithography and etching processes. The width and length of the wire were determined by scanning electron microscope (SEM) as 180 nm and 35 µm respectively. At 300 K the thermal conductivity of nanowire is ~ 20% of the bulk, it diminishes to lower value as temperature decreases. The consequence is opposite to that of the bulk and might be explained by the ristriction of mean free paths of electron/phonon-phonon interactions due to the grain boundaries. An enhancement of specific heat ~250% of the bulk is also observed. In addition, the resistivity of nanowire at room temperature is about four times larger than that of the bulk. The small relative resistiv-ity ratio (RRR) confirms the polycrystalline characteristic of the nanowire.

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“…[5] Thin films of silver have been deposited by many non-vacuum techniques including electrodeposition, [6] photochemical deposition, [7] electroless deposition, [8] and sol-gel. [9] Physical vapor deposition techniques include vacuum evaporation, [10] sputtering, [5,11,12] pulsed laser deposition, [13] electron beam evaporation, [14] and molecular beam epitaxy. [15] Among these various techniques, CVD has the advantage of potentially superior step-coverage, and is a single-step process which can easily be scaled up to deposit high purity films over large areas.…”

Section: Introductionmentioning

confidence: 99%

The Aerosol‐Assisted CVD of Silver Films from Single‐Source Precursors

Panneerselvam

Malik

O’Brien

et al. 2009

Chemical Vapor Deposition

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Thin films of silver are deposited from tetraphenyldioxoimidodiphosphinato silver(I) [Ag{(OPPh 2 ) 2 N}] 4 Á 2H 2 O (1) and silver(I) triflouoroacetate CF 3 COOAg (2) single-source precursors (SSPs) by the aerosol-assisted (AA)CVD method. The complex (1) is a tetramer with linear and distorted tetrahedral coordination modes at silver. Two types of films, silvery and brownish, are observed from both SSPs due to the temperature gradient in the AACVD reactor. The as-deposited films are characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive X-ray (EDX) analysis, and ultraviolet/visible (UV-vis) spectroscopy methods.

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Low-temperature resistance and its temperature dependence in nanostructured silver

Cited by 47 publications

References 15 publications

Fabrication of interconnects using pressureless low temperature sintered Ag nanoparticles

Fabrication of interconnects using pressureless low temperature sintered Ag nanoparticles

Thermal and electrical transport properties of a single nickel nanowire

The Aerosol‐Assisted CVD of Silver Films from Single‐Source Precursors

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