2007
DOI: 10.1002/adma.200602764
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Low‐Temperature Epitaxial Growth of Vertical In2O3 Nanowires on A‐Plane Sapphire with Hexagonal Cross‐Section

Abstract: Epitaxial growth of vertical In2O3 (111) nanowires with hexagonal cross‐section on a‐plane sapphire is reported. The figure showing the vertical wires is viewed at 45° from the substrate normal. These wires taper gradually towards the tops and they start to bend near the tips. Because of the low‐temperature growth, the wires possess a new hexagonal symmetry and a shortest photoluminescence wavelength among those that have been reported for In2O3 nanowires.

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Cited by 49 publications
(47 citation statements)
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References 24 publications
(27 reference statements)
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“…Although still challenging, procedures for achieving horizontal alignment of NWs are somewhat less restrictive since they are not limited to the direct growth of horizontally aligned NS [1,2] but can also be aligned using liquid suspensions of presynthesized NWs as well [3,4]. However, methods for obtaining vertically aligned semiconductor oxide NS require epitaxial growth, and in fact, vertically aligned NS of Ga 2 O 3 [5], InAs [6], In 2 O 3 [7,8], ZnGa 2 O 4 [9] and ZnO [10,11] have been successfully synthesized in this way. Currently, ZnO NWs have attracted a significant amount of attention due to the relative simplicity of their synthesis under a variety of conditions [12][13][14][15] and due to the wide array of potential applications (e.g., sensing [16], piezoelectricity [17] and field emission [18,19]).…”
Section: Introductionmentioning
confidence: 98%
“…Although still challenging, procedures for achieving horizontal alignment of NWs are somewhat less restrictive since they are not limited to the direct growth of horizontally aligned NS [1,2] but can also be aligned using liquid suspensions of presynthesized NWs as well [3,4]. However, methods for obtaining vertically aligned semiconductor oxide NS require epitaxial growth, and in fact, vertically aligned NS of Ga 2 O 3 [5], InAs [6], In 2 O 3 [7,8], ZnGa 2 O 4 [9] and ZnO [10,11] have been successfully synthesized in this way. Currently, ZnO NWs have attracted a significant amount of attention due to the relative simplicity of their synthesis under a variety of conditions [12][13][14][15] and due to the wide array of potential applications (e.g., sensing [16], piezoelectricity [17] and field emission [18,19]).…”
Section: Introductionmentioning
confidence: 98%
“…22 It is important to note that for avoiding fatigue in paper study, some substantial and vital verifi- cation are explained in Ref. 22. This will also be evident from the X-ray analysis presented below.…”
Section: Structure and Morphologymentioning
confidence: 79%
“…It is interesting to note that the bending of the tips was initiated by the growth in other non-(111) crystal faces but majority of the entire nanowire was still a single crystal. 22 It is important to note that for avoiding fatigue in paper study, some substantial and vital verifi- cation are explained in Ref. 22.…”
Section: Structure and Morphologymentioning
confidence: 99%
“…1(c 0 )), formed just before the nanoparticle end. The existence of nanoparticles on top of the nanorods is the typical characteristic of VLS growth with the assistance of metal catalyst [5,8,9]. In the VLS growth method [10], a liquid phase is formed initially due to the formation of a eutectic phase or the presence of a low-melting-point phase in an alloy system, which consists of the substrate or the vapor phase constituent.…”
Section: Resultsmentioning
confidence: 99%
“…Bourlange et al [4] reported the growth of high-quality In 2 O 3 thin films on Y-stabilized ZrO 2 (0 0 1) substrates by molecular beam epitaxy (MBE), and they also suggested the fundamental bandgap of In 2 O 3 to be 2.67 eV, much smaller than the widely quoted value of 3.75 eV. In order to synthesise In 2 O 3 nanostructures, extrinsic metal catalyst, e.g., Au, was employed to realize the vaporliquid-solid (VLS) growth mechanism in the carbothermal reduction method [1,5], as well as in the vapor transport and condensation method [6]. The usage of such an extrinsic catalytic metal is generally not desired in semiconductors since it may act as impurities in the product.…”
Section: Introductionmentioning
confidence: 99%