Low temperature epitaxial growth of CeO2(110) layers on Si(100) using electron beam assisted evaporation

Enhancement in electrical and stability properties of amorphous polymer based nanocomposite electrolyte

“…The essence of mechanism lies in a direct interaction of n-CeO 2 with both the polymer host and the conducting species (i.e., Li + /ClO 4 − ) in the composite matrix. This interaction, evidenced from FTIR analysis, seems convincing in view of very high permittivity of n-CeO 2 (~26) [35] in comparison to ε r~3 -4 for the host polymer holding cations at its electron rich carbonyl oxygen sites (C Ö). In addition, the hard Lewis acid character of n-CeO 2 acts as a catalyst for filler interaction with the polymer host at its electron rich site as well as with the anion ClO 4 − in the matrix that acts as the Lewis base.…”

The surface chemistry of cerium oxide

“…However, ceria thin films on Si(100) generally produced CeO 2 (110) surfaces. [138][139][140][141][142] Growth of CeO 2 (100) could be induced by biasing the Si(100) substrate during deposition by magnetron sputtering [143] or by irradiating the Si(100) substrate with an electron beam during deposition. [144] There have only been a few reported examples of growing CeO 2 ( (100) was also deposited by MOCVD on polycrystalline Hastelloy C276, a Ni-based multi-element alloy.…”

“…[43] This is a stepped surface with two-dimensional symmetry where the spacing between the O ions in the short direction has a good lattice match to CeO 2 (110). CeO 2 (110) was also grown on Si(100) [138,[140][141][142] and on YSZ (110). [131] While there have been a number of reports of computational studies of adsorption and reaction on the CeO 2 (110) surface there have not yet been any experimental studies reported.…”

Physical characterization of post-deposition annealed metal-organic decomposed cerium oxide film spin-coated on 4H-silicon carbide

“…Previously, a large body of work has been carried out on CeO 2 film deposited on Si substrate using various deposition techniques, such as spray pyrolysis, electron beam evaporation, reactive sputtering, ion-beam sputtering, metal-organic decomposition (MOD), pulsed laser deposition and others [34][35][36][37][38][39][40][41][42][43][44][45][46][47][48]. Among these techniques, MOD method appears to be a convenient route due to its simplicity in processing control and accuracy in composition control [49] if compared to vacuum techniques, such as reactive sputtering and electron beam evaporation [34,37,40]. In MOD technique, a water-insensitive carboxylate or ␤-diketonate (acetylacetonate-type) compounds are used and there is no involvement of complex chemical reaction [50,51].…”