2008
DOI: 10.1364/ao.47.00c297
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Low temperature deposition of indium tin oxide films by plasma ion-assisted evaporation

Abstract: Coatings of transparent conductive oxides, especially indium tin oxide (ITO), are important in different fields. So far, application of these materials has been limited to substrates with high thermal stability. We describe an improved coating process for ITO based on plasma ion-assisted evaporation at a substrate temperature below 100 degrees C, which is suitable for organic substrates. In characterizing the thin films, we used the classical Drude theory to calculate the resistivity from optical film properti… Show more

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Cited by 17 publications
(11 citation statements)
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“…It is almost comparable with the lowest resistivity of 1.07 10 cm ever reported for the ITO film after annealing in vacuum at 350 C for 1 hour [34]. As mentioned, one of the methods to further reduce the resistivity of AYZO films is attributed to the thermal activation of Al, Yb, and ionized oxygen vacancies [35], [36]. Therefore, the annealing process in oxygen-deficient environment significantly decreases the resistivity of AYZO films.…”
Section: Resultssupporting
confidence: 81%
“…It is almost comparable with the lowest resistivity of 1.07 10 cm ever reported for the ITO film after annealing in vacuum at 350 C for 1 hour [34]. As mentioned, one of the methods to further reduce the resistivity of AYZO films is attributed to the thermal activation of Al, Yb, and ionized oxygen vacancies [35], [36]. Therefore, the annealing process in oxygen-deficient environment significantly decreases the resistivity of AYZO films.…”
Section: Resultssupporting
confidence: 81%
“…46 Such plasma electrode devices, however, provide very little ability to cool the DKDP crystal, and could present difficulties in high average power applications. A potential alternative is the use of transparent, conductive thin film electrodes based on materials such as indium tin oxide (ITO), 47,48,49 which has been demonstrated with optical damage thresholds in the 3~11 J/cm 2 range. 47,48 It is challenging to achieve both high transparency (a prerequisite for high damage threshold) and low resistivity for ITO that is directly deposited on DKDP.…”
Section: Gain Isolationmentioning
confidence: 99%
“…The annealing refined result is comparable with the lowest resistivity of 1.07ϫ 10 −4 ⍀ cm ever reported 12 for ion-assisted e-beam evaporated ITO film after vacuum annealing at 350°C for 1 h. One of the methods to improve ITO conductivity is attributed to thermal activation of Sn and ionized oxygen vacancies. 13,14 Annealing with oxygen-deficient environment essentially improves ITO conductivity. A higher annealing temperature inevitably introduces faster indiffusion of residual oxygen into ITO without severe control on oxygen invasion.…”
Section: Nanograin Crystalline Transformation Enhanced Uv Transparencmentioning
confidence: 99%