Low temperature deposition of crystalline AlN films by bias-enhanced Cat-CVD

Wang, Guoju; Wang, Bo; Huang, Anping; Xu, Shilong; Zhu, Mankang; Wang, Biben; Yan, Hui

doi:10.1016/j.matlet.2004.03.018

Cited by 4 publications

(3 citation statements)

References 14 publications

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“…The aluminum nitride is one of the effective protection films with high hardness and high thermal conductivity. [1,2] The aluminum nitride film has been produced by using various processing techniques such as plasma nitriding, [3] CVD, [4] PVD, [5] spray coating, [6] and gas nitriding, [7] and these studies have already been reported by many researchers. In the conventional process, the nitriding of the aluminum surface is very difficult because of the thin aluminum oxide layer existing on the surface.…”

Section: Introductionmentioning

confidence: 99%

Surface Modification of Aluminum Using a Combined Technique of Barrel Nitriding and Plasma Nitriding

Okumiya

Yoshida

Ichiki

et al. 2009

Plasma Processes & Polymers

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In this study, a new nitriding process is proposed to produce the aluminum nitride on the aluminum surface. A process of combined barrel and plasma nitriding techniques was used. By using the barrel nitriding process, an aluminum nitride layer with high thickness can be formed within a matter of hours, and the surface hardness can be improved by using the plasma nitriding. It is suggested that a combined technique of the barrel nitriding and the plasma nitriding is one of the most promising surface treatments for the aluminum.

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Section: Introductionmentioning

confidence: 99%

Surface Modification of Aluminum Using a Combined Technique of Barrel Nitriding and Plasma Nitriding

Okumiya

Yoshida

Ichiki

et al. 2009

Plasma Processes & Polymers

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show abstract

“…[1] So far, deposition, ion implantation, and plasma techniques have been used to form the aluminum nitride films on aluminum substrates. [2][3][4] However, these processes have a problem in terms of the delamination of the film caused by thermal stress, that is, thermal stress cracking. Delamination of the film is affected by the mechanical properties of the modified layer and substrate, [5] and the mechanical properties of film strongly depend on the coating method.…”

Section: Introductionmentioning

confidence: 99%

“…Recently, aluminum and aluminum alloys have been a focus of constant attention as alternative materials of steel 1. So far, deposition, ion implantation, and plasma techniques have been used to form the aluminum nitride films on aluminum substrates 2–4. However, these processes have a problem in terms of the delamination of the film caused by thermal stress, that is, thermal stress cracking.…”

Section: Introductionmentioning

confidence: 99%

Mechanical Properties of Aluminum Nitride Layer Formed by Duplex Coating of Barrel Nitriding and Plasma Nitriding

Yoshida

Okumiya

Ichiki

et al. 2009

Plasma Processes & Polymers

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Aluminum nitride layers on aluminum are formed by the barrel nitriding in nitrogen gas, and duplex coatings are performed with the plasma nitriding in nitrogen and argon gas after the barrel nitriding. Aluminum nitride films with high thickness, high surface hardness, and good adhesion can be obtained on aluminum surfaces by using the above process. Hardness and Young's modulus of the AlN formed by the barrel nitriding is estimated by means of the rules of mixture. The microstructure of the AlN is proved to be composed of Al and AlN. It is suggested that the AlN formed by the barrel nitriding can play a role as the adhesion improvement of the AlN formed by the plasma nitriding. Furthermore, a microindentation test, which can obtain indentation load–penetration displacement curves, is performed in order to investigate the film fracture of the AlN.

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Preparation of the c-axis oriented AlN film by laser chemical vapor deposition using a newly proposed Al(acac)3 precursor

You¹,

Ito²,

Tu³

et al. 2013

Journal of Crystal Growth

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Low temperature deposition of crystalline AlN films by bias-enhanced Cat-CVD

Cited by 4 publications

References 14 publications

Surface Modification of Aluminum Using a Combined Technique of Barrel Nitriding and Plasma Nitriding

Surface Modification of Aluminum Using a Combined Technique of Barrel Nitriding and Plasma Nitriding

Mechanical Properties of Aluminum Nitride Layer Formed by Duplex Coating of Barrel Nitriding and Plasma Nitriding

Preparation of the c-axis oriented AlN film by laser chemical vapor deposition using a newly proposed Al(acac)3 precursor

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