Low-stress phase plates produced by serial bideposition of TiO<sub>2</sub>thin films

Tolenis, Tomas; Grinevičiūtė, Lina; Mažulė, Lina; Selskis, Algirdas; Drazdys, Ramutis

doi:10.1117/1.jnp.10.036003

Cited by 4 publications

(2 citation statements)

References 12 publications

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“…Crystallinity and inner nano‐structure in thin film material can also cause optical losses . Therefore, scanning electron microscopy (SEM) and X‐ray diffraction were used for analysis of the inner structure of nano‐sculptured thin films.…”

Section: Resultsmentioning

confidence: 99%

“…[26] Crystallinity and inner nano-structure in thin film material can also cause optical losses. [27] Therefore, scanning electron In the beginning of the film growth, average widths of the columns were equal to 29 nm for silica and 20 nm for alumina. When films thicknesses reached 400 nm, the coalescence of columns has been started and the width of the individual element extended to 31 and 88 nm for SiO 2 and Al 2 O 3 , respectively.…”

Section: Structural and Elemental Analysis Of Nano-sculptured Thin Filmsmentioning

confidence: 99%

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Highly Resistant Zero‐Order Waveplates Based on All‐Silica Multilayer Coatings

Grinevičiūtė

Andrulevičius

Melninkaitis

et al. 2017

Physica Status Solidi (a)

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Waveplates, used to modify polarization state of light, are integral part of high‐power lasers. Classical approach to waveplate manufacturing is based on combination of birefringent crystalline materials and deposition of nonpolarizing antireflection (AR) coatings. Their limitation to withstand maximal peak power is determined by laser‐induced damage (LID) phenomena, mainly determined by low band‐gap materials used in AR coatings. In this study, a novel multi‐layer approach of high band‐gap birefringent coatings was proposed and investigated to overcome this limitation. Three eligible candidate materials, namely LaF3, Al2O3, and SiO2 are investigated. Structural and optical analysis reveal superior properties of silica for UV spectral range. Zero‐order thin film retarders based on all‐silica nano‐structures are fabricated by oblique angle deposition process. Low optical losses and high transparency (T ∼ 99%) are demonstrated while indicating potential to withstand high laser fluence of 40 J cm−2 in nanosecond regime at 355 nm wavelength. Such waveplates can essentially improve maximal tolerated peak power and thus allow production of more compact optical systems, even when high laser power is used.

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Section: Resultsmentioning

confidence: 99%

Section: Structural and Elemental Analysis Of Nano-sculptured Thin Filmsmentioning

confidence: 99%