Low-pressure inductively coupled plasma etching of benzocyclobutene with SF6/O2 plasma chemistry

Douglas, Erica Ann; Stevens, Jeffrey; Fishgrab, Kira L.; Ford, C. W.; Shul, R. J.; Pearton, S. J.

doi:10.1116/1.4758765

Cited by 11 publications

(8 citation statements)

References 14 publications

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“…Negative ions appear in many gases that are often used in plasma technologies. Fluorine-containing gases (Carbon tetrafluoride CF 4 , Sulfur hexafluoride SF 6 and others) are widely used not only for etching different materials [1][2][3][4][5], but also for different plasma treatments of polymers' surfaces with the aim of changing their wetting properties, surface cleaning and activation before metal or paint layer deposition, for controlling their biocompatibility, chemical resistance [6][7][8][9][10], polymer film deposition [11], etc. Therefore our university students who study elementary processes in plasmas and plasma technologies carry out a set of undergraduate laboratory works.…”

Section: Introductionmentioning

confidence: 99%

Finding relative negative ions concentration in dc glow discharges during undergraduate laboratory work

Lisovskiy,

Dudin,

Yegorenkov

2023

Phys. Scr.

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In this paper, we present a laboratory work implementing a simple method for finding the relative concentration of negative ions in the plasma of a contracted positive column of DC glow discharge. With this method, university students can study processes in gas discharge plasmas in technological gases during their undergraduate laboratory work. The method is based on measuring the positive column radius after the glow discharge transition from a diffuse to a contracted mode. The basics of the physical processes in electronegative plasma and conditions of the positive column contraction are discussed in the paper as well as the practical implementation of the proposed technique. We describe our experimental setup and conditions, and present the experimental data illustrating the method capabilities. Values of the relative concentration of negative ions found with the offered method reasonably agree with other authors’ data obtained by widely accepted diagnostic techniques.

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Section: Introductionmentioning

confidence: 99%

Finding relative negative ions concentration in dc glow discharges during undergraduate laboratory work

Lisovskiy,

Dudin,

Yegorenkov

2023

Phys. Scr.

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“…They have unique properties and are attracting increasing interest because of their importance for plasma processing applications [1]. In particular, ICPs are used for the sterilization and decontamination of sensitive surfaces [2][3][4][5], plasma etching [6][7][8][9][10][11][12][13][14], diamond [15,16] and vapor [17] deposition, particle generation [18,19] as well as the growth of carbon nanotubes [20]. Additionally, ICPs are used in the atomic clocks of the global positioning system (GPS) [21] and for thrusters in electric propulsion [22].…”

Section: Introductionmentioning

confidence: 99%

On the E-H transition in inductively coupled radio frequency oxygen plasmas: I. Density and temperature of electrons, ground state and singlet metastable molecular oxygen

Wegner

Küllig

Meichsner

2017

Plasma Sources Sci. Technol.

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In this series of two papers, the E-H transition in a planar inductively coupled radio frequency discharge (13.56 MHz) in pure oxygen is studied using comprehensive plasma diagnostic methods. The electron density serves as the main plasma parameter to distinguish between the operation modes. The (effective) electron temperature, which is calculated from the electron energy distribution function and the difference between the floating and plasma potential, halves during the E-H transition. Furthermore, the pressure dependency of the RF sheath extension in the E-mode implies a collisional RF sheath for the considered total gas pressures. The gas temperature increases with the electron density during the E-H transition and doubles in the H-mode compared to the E-mode, whereas the molecular ground state density halves at the given total gas pressure. Moreover, the singlet molecular metastable density reaches 2% in the E-mode and 4% in the H-mode of the molecular ground state density. These measured plasma parameters can be used as input parameters for global rate equation calculations to analyze several elementary processes. Here, the ionization rate for the molecular oxygen ions is exemplarily determined and reveals, together with the optical excitation rate patterns, a change in electronegativity during the mode transition.

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“…Inductively coupled radio frequency (RF) discharges (ICP) enable a wide range of applications and attracted an increasing interest so that they have been gained importance for plasma processing applications [1], e.g., in semiconductor industry and for light source technology [2]. ICPs are more recently being used for plasma etching [3][4][5][6][7][8][9][10][11], sterilization and decontamination of sensitive material surfaces [12][13][14], particle generation [15,16], growth of carbon nano tubes [17], polymerization [18], diamond deposition [19,20] surface modification [21] and vapor deposition [22]. Additionally, ICPs are also used in life science [23], for atomic clocks for the global positioning system (GPS) [24] and they are used for thrusters in electric propulsion [25].…”

Section: Introductionmentioning

confidence: 99%

E‐H Transition in Argon/Oxygen Inductively Coupled RF Plasmas

Wegner

Küllig

Meichsner

2015

Contrib. Plasma Phys.

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This contribution presents results of comprehensive investigation of the E-H transition in an inductively coupled radio frequency argon/oxygen discharge at 13.56 MHz. For the characterization of the discharge arrangement, the spatial magnetic and electric field components of the planar coil in vacuum are calculated and provide information about the electron heating region. The used double coil leads to a radial symmetric field distribution. Further, voltage and current probe measurements reveal the inductivity of the coil and the phase shift between the coil voltage and the current. As a result, the coil current and the RF voltage are directly proportional. The phase shift is nearly constant in the E-mode and decreases slightly in the H-mode. The positive ion saturation current as well as the line integrated electron density are measured by means of Langmuir probe and 160 GHz microwave interferometer, respectively, to study the mode transition in argon with different oxygen contents. The positive ion saturation current and the electron density decrease with increasing oxygen admixture at fixed pressure and RF power. The onset and the way of the E-H transition strongly depend on the oxygen content. The mode transition of a pure argon discharge is step like and changes to a continuous mode transition with the admixture of oxygen.

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Low-pressure inductively coupled plasma etching of benzocyclobutene with SF6/O2 plasma chemistry

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Cited by 11 publications

References 14 publications

Finding relative negative ions concentration in dc glow discharges during undergraduate laboratory work

Finding relative negative ions concentration in dc glow discharges during undergraduate laboratory work

On the E-H transition in inductively coupled radio frequency oxygen plasmas: I. Density and temperature of electrons, ground state and singlet metastable molecular oxygen

E‐H Transition in Argon/Oxygen Inductively Coupled RF Plasmas

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