2020
DOI: 10.1038/s41928-020-0405-0
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Low-power linear computation using nonlinear ferroelectric tunnel junction memristors

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Cited by 151 publications
(153 citation statements)
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“…The change in the polarization (P) of the ferroelectric domain provides a significant basis for the conductance change of ferroelectric synapses, as shown in Figure 2d. [80][81][82][83][84][85]120] Metals and semiconductors have been used for two-electrode terminals where the two-terminal junction is separated by a ferroelectric layer (e.g., lead zirconate titanate (PZT) and Hf 0.5 Zr 0.5 O 2 (HZO)). [80][81][82][83][84][85]120] The orientation of the P in the ferroelectric material can be aligned differently, depending on the polarity of the external electric field.…”
Section: Ferroelectric Synapsementioning
confidence: 99%
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“…The change in the polarization (P) of the ferroelectric domain provides a significant basis for the conductance change of ferroelectric synapses, as shown in Figure 2d. [80][81][82][83][84][85]120] Metals and semiconductors have been used for two-electrode terminals where the two-terminal junction is separated by a ferroelectric layer (e.g., lead zirconate titanate (PZT) and Hf 0.5 Zr 0.5 O 2 (HZO)). [80][81][82][83][84][85]120] The orientation of the P in the ferroelectric material can be aligned differently, depending on the polarity of the external electric field.…”
Section: Ferroelectric Synapsementioning
confidence: 99%
“…[80][81][82][83][84][85]120] Metals and semiconductors have been used for two-electrode terminals where the two-terminal junction is separated by a ferroelectric layer (e.g., lead zirconate titanate (PZT) and Hf 0.5 Zr 0.5 O 2 (HZO)). [80][81][82][83][84][85]120] The orientation of the P in the ferroelectric material can be aligned differently, depending on the polarity of the external electric field. [121,122] The modulation of P for a metal/ferroelectric layer/semiconductor (MFS) junction can alter the junction resistance, which might be attributed to asymmetric screening effects at the interfaces between the metal/ferroelectric and the semiconductor/ferroelectric layers.…”
Section: Ferroelectric Synapsementioning
confidence: 99%
“…Performance CMOS technology [35] This work [36] Speed 2.29 ns 780 ns 195 ps [37] Figure 7. The output current results with different resistance variations.…”
Section: Performance Evaluation Of Hw Calculationmentioning
confidence: 99%
“…Another challenge is the difficulty of synthesising large-area vdW ferroelectric films, which limits the scaling up potential of vdW FTJs. Nevertheless, with the establishment of new programming schemes 9 , we expect that vdW FTJs will prove to be of value in the development of highly energy-efficient data storage and in-memory computing. ❐ Xinran Published online: 5 August 2020 https://doi.org/10.1038/s41928-020-0463-3…”
Section: Ferroelectric Tunnel Junctions With High Tunnelling Electrormentioning
confidence: 99%