We present a high-performance InGaN/GaN heterojunction phototransistor with the responsivity (R λ )> 8 (A/W), low noise-equivalent-power (NEP)< 1.1×10 -17 (W-Hz -0.5 ) and high detectivity (D*)> 1.2×10 14 (cm-Hz 0.5 -W -1 ). OCIS codes: (040.7190) Ultraviolet; (040.5160) Photodetector; (040.6070) Solid-State Detectors.Photodetectors (PDs) based on III-Nitride (III-N)-based platforms have numerous advantages for ultra-violet (UV) radiation detection, including low dark current density, high breakdown field, better chemical resistance and wider operational temperature range. To date, high-performance UV PDs, such as III-N p-i-n diodes, avalanche photodetectors (APDs), and metal-semiconductor-metal (MSM) detectors have been widely reported [1][2][3][4][5]. On the other hand, phototransistors serve as another choice for UV PDs because they are expected to provide high gain transistor action. In the past, phototransistors based on lower bandgap materials have been demonstrated for infrared detection and fiber-optic communications [6]. However, since photocurrent gains in phototransistors are essentially related to the epitaxial material quality of the constituent bipolar transistor structures, fewer developments in III-Nbased phototransistors were reported [7,8].In this paper, we report a top-illuminated InGaN/GaN heterojunction phototransistor (HPT) grown on sapphire substrates. The HPT layer structure consists of a 2.5-μm-thick unintentionally doped GaN buffer layer, followed by a 880-nm Si-doped n-GaN sub-collector layer (n=3×10 18 cm -3 ), a 320-nm n-GaN collector layer (n= 1×10 17 cm -3 ), a 30-nm In x Ga 1-x N (x= 0-0.03) graded collector layer, a 110-nm Mg-doped In 0.03 Ga 0.97 N base layer (p~ 1×10 18 cm -3 ), a 30-nm In x Ga 1-x N (x=0.03-0) graded emitter layer and a 120-nm Si-doped n-GaN cap layer (n= 1×10 19 cm -3 ). The device fabrication starts with the mesa formation to expose the sub-collector layer using an ICP dry etching tool. After ICP etching, Ti-based ohmic contacts are used for both emitter and collector contacts. As shown in Fig. 1, under the dark condition, the leakage current density is <10 -7 (A/cm 2 ) at V CE = 3 V and <10 -5 (A/cm 2 ) at V CE = 10 V. These results represent the lowest dark current density reported to date for III-N HPTs in the same bias range [7,8], indicating high-quality epitaxial layers were achieved. Figure 2 shows the spectral response of the HPT biased at V CE = 5 V. The device under test was illuminated from the top at the selected optical wavelengths. The inset of Fig. 2 shows a cross-sectional view of the fabricated HPT. The data show that the HPT responds to photons with λ< 410 nm and the photocurrent (I C(opt) ) peaks at λ~ 373 nm with a cutoff wavelength at λ= 410 nm. Figure 3 shows the measured I C(opt) as a function of V CE for the fabricated device under different optical power density (P opt ) illumination. As the UV light (λ= 373 nm) is illuminated on the transistor, I C(opt) remains approximately constant for a fixed input optical power. Figure 4 shows th...