2009
DOI: 10.1063/1.3180707
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Low-frequency electronic noise in the double-gate single-layer graphene transistors

Abstract: The authors report the results of an experimental investigation of the low-frequency noise in the double-gate graphene transistors. The back-gate graphene devices were modified via addition of the top gate separated by ∼20 nm of HfO2 from the single-layer graphene channels. The measurements revealed low flicker noise levels with the normalized noise spectral density close to 1/f (f is the frequency) and Hooge parameter αH≈2×10−3. The analysis of noise spectral density dependence on the top and bottom gate bias… Show more

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Cited by 137 publications
(126 citation statements)
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“…[25] Interestingly, environmental exposure and ageing of graphene devices also increase the level of noise, suggesting that a proper capping layer or surface functionalization may circumvent an increase of noise. [69] Indeed, by encapsulating a single layer graphene between two layers of hexagonal boron nitride (h-BN, as shown in Fig. 2c), the noise spectral density normalized to the channel area (blue dots, Fig.…”
Section: Electrical Noise Performances Of Graphene Materialsmentioning
confidence: 99%
“…[25] Interestingly, environmental exposure and ageing of graphene devices also increase the level of noise, suggesting that a proper capping layer or surface functionalization may circumvent an increase of noise. [69] Indeed, by encapsulating a single layer graphene between two layers of hexagonal boron nitride (h-BN, as shown in Fig. 2c), the noise spectral density normalized to the channel area (blue dots, Fig.…”
Section: Electrical Noise Performances Of Graphene Materialsmentioning
confidence: 99%
“…The latter can improve the saturation velocity in graphene when it is limited by the surface electronphonon scattering [23]. The lower trap density achievable in diamond, compared to SiO 2 , indicates a possibility of reduction of the 1/f noise in graphene-on-diamond devices [24], which is essential for applications in r.f. transistors and interconnects.…”
mentioning
confidence: 99%
“…For example, α H for the single-wall carbon nanotubes was ≈0.01 in a supported condition [37] and 0.001 in a suspended condition. [38] A highly reduced α H of 0.001 was obtained in the exfoliated graphene, [39,40] while 0.006-0.011 in the CVD graphene; [32] and their representative values are included in Figure 4. Among the conventional III-V semiconductors, including the GaAs and the InSb used in the devices for light sensing, signal mixing, and amplification, α H of ≈0.002 is commonly observed.…”
mentioning
confidence: 99%