“…[
9–12 ] Still, substrate temperatures for conventional CVD from HMDS need to be around
or higher, making this process unsuitable for film deposition, for example, on heat‐sensitive polymer surfaces. Therefore, several techniques for thin‐film deposition have been developed to overcome this challenge including hot‐wire CVD (HW‐CVD), [
13 ] ion beam deposition [
14–16 ] , and PE‐CVD at low pressures. [
17–20 ]…”