Low energy electron beam microcolumn lithography

Kim, Ho Seob; Kim, Young Chul; Kim, Daewook; Ahn, Sung-Ho; Jang, Yong Ju; Kim, Hyung Woo; Seong, Do Jin; Park, Kyoung Wan; Park, Seong Soon; Kim, Byung Jin

doi:10.1016/j.mee.2006.01.099

Cited by 13 publications

(4 citation statements)

References 15 publications

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“…In this concept, the beamlets are separated everywhere in the machine in order to prevent Coulomb interactions. In some systems, every beamlet has its own full electron optics with electron source, lenses, alignment coils, stigmators, etc., [22][23][24][25][26][27], so each column is a small SEM or Gaussian electron beam machine. The lenses and deflector units are made using MEMS technology, as shown in Fig.…”

Section: Discussion Of Systems Using Memsmentioning

confidence: 99%

The role of MEMS in maskless lithography

Kruit

2007

Microelectronic Engineering

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Section: Discussion Of Systems Using Memsmentioning

confidence: 99%

The role of MEMS in maskless lithography

Kruit

2007

Microelectronic Engineering

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“…Electron beam (E-beam) lithography is a technique for forming a photoresist (PR) pattern on a sample surface by bonding or cutting off polymers constituting a PR by irradiating high-energy electrons onto the surface of a sample coated with an E-beam reactive PR. Beginning from the scanning electron microscopy (SEM) technology in the 1950s [1], the E-beam lithography technique has been consistently developed towards the fabrication of smaller features with higher resolutions, based on tactful beam source deployment, use of an ultrafine-precision staging and optical system, and resist enhancement [1][2][3][4][5][6][7]. Careful tuning has also been investigated for application to various other materials, such as biological cells and soft polymers [8][9][10].…”

Section: Introductionmentioning

confidence: 99%

“…Seams can be reduced to a very small extent by controlling the molding material and exposure conditions [49], which can be applied to large area displays, but some applications still require perfect seamless nanopatterns throughout the entire area. Many other methods have been presented to fabricate the roll-type master stamps [5][6][7][48][49][50], but these mostly suffer from similar issues, particularly regarding the translation from the flat plate to the cylindrical surface.…”

Section: Introductionmentioning

confidence: 99%

Nanopatterning on the cylindrical surface using an E-beam pre-mapping algorithm

Lee

Jeong

2018

J. Micromech. Microeng.

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Lithography technology has advanced from flat plates to cylindrical surfaces, aiming to address the emerging needs in flexible and mass-customized applications. Nanoscale ultraprecise patterns have benefited from advanced lithography techniques also involving precision stage technology and material development. While conventional lithography mostly relies on flat wafer-base processing, fabricating nanopatterns on cylindrical surfaces can further expand the applicability and productivity of nanoscale lithography, for example, by integrating with the continuous and scalable plate-to-roll or roll-to-roll nanopatterning techniques. In this regard, we develop a novel nanopatterning methodology that can directly create a nanoscale pattern on the surface of a cylindrical mould by utilizing the E-beam pre-mapping algorithm for uniform E-beam exposure. Here, E-beam pre-mapping was employed to ensure uniform exposure over the cylindrical surface from the planar E-beam source, where the trajectory of the E-beam is modulated along the curved surface of the cylinder based on the pre-calibration of the surface profile. We design and build up a cylindrical exposure system with an E-beam gun that can move at a high degree of freedom. We also perform in-depth analytic modelling and profiling of the target curved surface, which is an essential step for applying E-beam pre-mapping for uniform exposure. By conducting the developed process, we finally achieve a very fine 60 nm scale half-pitch pattern on the cylindrical surface, which may be further extended to enable direct nanopatterning on curved surfaces for many unique applications.

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“…Owing to the high fabrication cost and long production time for photomasks, the multi photomask lithography processes are driving the development of lithography without conventional photomasks. 1) There were reports about maskless photography methods such as the use of the digital mirror device (DMD), [2][3][4][5][6][7][8] laser direct imaging (LDI), [9][10][11][12][13][14] electron beam lithography (EBL), [15][16][17][18][19][20][21] ion beam lithography (IBL), [22][23][24] and the use of the liquid crystal mask (LCM). [25][26][27] LCM photolithography technology can shorten the develop time and reduce the production cost of PCBs compared with the conventional photolithography technology.…”

Section: Introductionmentioning

confidence: 99%

Development of Photolithography Process for Printed Circuit Board Using Liquid Crystal Mask in Place of Photomask

Lee²,

Hong

et al. 2012

Jpn. J. Appl. Phys.

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The state-selective dissociation dynamics for anionic and excited neutral fragments of gaseous SiCl 4 following Cl 2p and Si 2p core-level excitations were characterized by combining measurements of the photoninduced anionic dissociation, x-ray absorption and UV/visible dispersed fluorescence. The transitions of core electrons to high Rydberg states/doubly excited states in the vicinity of both Si 2p and Cl 2p ionization thresholds of gaseous SiCl 4 lead to a remarkably enhanced production of anionic, Si − and Cl − , fragments and excited neutral atomic, Si * , fragments. This enhancement via core-level excitation near the ionization threshold of gaseous SiCl 4 is explained in terms of the contributions from the Auger decay of doubly excited states, shake-modified resonant Auger decay, or/and post-collision interaction. These complementary results provide insight into the state-selective anionic and excited neutral fragmentation of gaseous molecules via core-level excitation.

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Low energy electron beam microcolumn lithography

Cited by 13 publications

References 15 publications

The role of MEMS in maskless lithography

The role of MEMS in maskless lithography

Nanopatterning on the cylindrical surface using an E-beam pre-mapping algorithm

Development of Photolithography Process for Printed Circuit Board Using Liquid Crystal Mask in Place of Photomask

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